Exhaust gas treatment apparatus and exhaust gas treatment method

Abstract

The application relates to an exhaust gas treatment apparatus and an exhaust gas treatment method for treating an exhaust gas discharged from a manufacturing apparatus or the like for manufacturing semiconductor devices, liquid crystals, LEDs, or the like, to make the exhaust gas harmless. The exhaust gas treatment apparatus for treating the exhaust gas, includes: a heat generating section including a heat generator-configured to generate heat; and a heat treatment section coupled to the heat generating section and configured to perform heat treatment on the exhaust gas with the heat. The heat treatment section includes: a cylindrical body that forms a flow passage for the exhaust gas; and a water supply structure configured to supply water in the cylindrical body to form a water film on an inner surface of the cylindrical body, and the cylindrical body has a diameter-increasing portion where a diameter of the cylindrical body increases.

Dependencies are inferred from the claim text.