System for processing gas and method for processing gas using the same

A system for processing a gas, the system comprising:

• a semiconductor fabricating device configured to perform a semiconductor fabricating process;
• a gas processing module disposed at one side of the semiconductor fabricating device;
• a gas supply unit connected to the semiconductor fabricating device to supply a gas, which is produced in the semiconductor fabricating process, to the gas processing module;
• and
• a gas discharge unit connected to the gas processing module to receive gas, which is processed, from the gas processing module and discharge the gas to an outside,
• wherein the gas processing module includes:
• a reaction container configured to receive the gas (G);
• a cover covering an upper end of the reaction container;
• a first electrode passing through the cover and extending into the reaction container;
• a second electrode passing through the cover, extending into the reaction container, and disposed at one side of the first electrode ;
• a third electrode passing through the cover, extending into the reaction container and interposed between the first electrode and the second electrode ;
• and
• an electrolyte solution disposed in the reaction container and configured to dissolve the gas.

A method for processing gas using a processing gas system, the method comprising:

• supplying CF4 gas into a reaction container of a gas processing module;
• applying a working voltage to a first electrode of the gas processing module;
• performing an oxidation reaction of an electrolyte solution by forming a potential difference between a second electrode and the electrolyte solution of the gas processing module;
• performing a reduction reaction of gas by transferring an electron, which is emitted through the oxidation reaction, to the first electrode through the second electrode;
• and
• discharging byproduct gas, which is produced through the reduction reaction, out of the gas processing system.