Loading patent…
AssigneeAdanced Technology Materials, Inc.
InventorsMark Holst, Rebecca Faller, Glenn Tom, Jose Arno, Ray Dubois
Estimating the term…
Apparatus and method for abatement of effluent from multi-component metal oxides deposited by CVD processes using metal source reagent liquid solutions which comprise at least one metal coordination complex including a metal to which is coordinatively bound at least one ligand in a stable complex and a suitable solvent medium for that metal coordination complex e.g., a metalorganic chemical vapor deposition (MOCVD) process for forming barium strontium titanate (BST) thin films on substrates. The effluent is sorptively treated to remove precursor species and MOCVD process by-products from the effluent. An endpoint detector such as a quartz microbalance detector may be employed to detect incipient breakthrough conditions in the sorptive treatment unit.
An apparatus for abatement of effluent from a CVD process for depositing multi-component metal oxide films on a substrate from corresponding metal source reagents, said apparatus comprising:
An apparatus for abatement of effluent from a liquid delivery CVD process for depositing BST on a substrate from a precursor composition including corresponding barium strontium titanate metalorganic source reagents, wherein organic solvent is contained in the precursor composition and/or employed as a flush medium in the liquid delivery CVD process, and organic solvent correspondingly is present in effluent from the liquid delivery CVD process, said apparatus comprising an effluent flow circuit including in sequence a metals trap, a motive fluid driver, and at least one sorbent comprising adsorbent material, wherein the adsorbent material comprises a carbon sorbent comprising an- oxidizing material selected from the group consisting of permanganates and metal oxides, having sorptive affinity for organic species.
Dependencies are inferred from the claim text.