Y10S 438/908
Utilizing cluster apparatus
Y10S438/908 (Utilizing cluster apparatus) appears on 169 US grants and 79 published applications in this corpus.
Search patents in Y10S- Granted patents
- 169
- Published applications
- 79
- Assignees
- 70
- Inventors
- 237
- Latest grant
- 28 May 2013
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1984 | 1 | 0 |
| 1985 | 3 | 0 |
| 1986 | 1 | 0 |
| 1987 | 0 | 0 |
| 1988 | 1 | 0 |
| 1989 | 1 | 0 |
| 1990 | 2 | 0 |
| 1991 | 1 | 0 |
| 1992 | 1 | 0 |
| 1993 | 2 | 0 |
| 1994 | 6 | 0 |
| 1995 | 6 | 0 |
| 1996 | 7 | 0 |
| 1997 | 0 | 0 |
| 1998 | 9 | 0 |
| 1999 | 17 | 0 |
| 2000 | 11 | 0 |
| 2001 | 15 | 7 |
| 2002 | 14 | 14 |
| 2003 | 7 | 7 |
| 2004 | 18 | 12 |
| 2005 | 6 | 2 |
| 2006 | 8 | 10 |
| 2007 | 3 | 5 |
| 2008 | 5 | 5 |
| 2009 | 4 | 6 |
| 2010 | 5 | 4 |
| 2011 | 7 | 5 |
| 2012 | 5 | 1 |
| 2013 | 3 | 1 |
By publication year. Applications have been published since 2001.
Recent patents
- Device for processing a substrate, method of processing a substrate and method of manufacturing semiconductor device28 May 2013US 8,448,599 B2Hitachi Kokusai Electric Inc.
- Advanced mixing system for integrated tool having site-isolated reactors9 Apr 2013US 8,414,703 B2Intermolecular, Inc.
- Suitably short wavelength light for laser annealing of silicon in DSA type systems26 Mar 2013US 8,405,175 B2APPLIED Materials.Inc.
- Method of manufacturing a semiconductor device6 Nov 2012US 8,304,350 B2Semiconductor Energy Laboratory Co.Ltd.
- Method and apparatus of fabricating semiconductor device24 Jul 2012US 8,227,355 B2Fujitsu Semiconductor Limited
- Advanced Mixing System for Integrated Tool Having Site-Isolated Reactors14 Mar 2013US 2013/0065796 A1Intermolecular, Inc.
- Advanced mixing system for integrated tool having site-isolated reactors13 Sep 2012US 2012/0231975 A1Intermolecular, Inc.
- Advanced mixing system for integrated tool having site-isolated reactors17 Nov 2011US 2011/0281773 A1Intermolecular, Inc.
- Device for processing a substrate, method of processing a substrate and method of manufacturing semiconductor device10 Nov 2011US 2011/0271907 A1Hitachi Kokusai Electric Inc.
- Suitably short wavelength light for laser annealing of silicon in dsa type systems25 Aug 2011US 2011/0204045 A1Applied Materials, Inc.
Most cited
By later US patents
- Compartnetalized substrate processing chamber732US 5,730,801 AAPPLIED Materials.Inc. · 1998
- Wafer processing cluster tool batch preheating and degassing apparatus663US 5,259,881 AMaterials Research Corporation · 1993
- Method and apparatus for automatically generating schedules for wafer processing within a multichamber semiconductor wafer processing tool656US 6,201,999 B1APPLIED Materials.Inc. · 2001
- Integrated module multi-chamber CVD processing system and its method for processing substrates655US 5,494,494 AAnelva Corporation · 1996
- Method and apparatus for scheduling wafer processing within a multiple chamber semiconductor wafer processing tool having a multiple blade robot619US 6,074,443 AAPPLIED Materials.Inc. · 2000