Suitably short wavelength light for laser annealing of silicon in DSA type systems
AssigneeApplied Materials, Inc.
InventorStephen Moffatt
Life of this patent
Estimating the term…
Abstract
The present invention generally relates to a thermal processing apparatus and method that permits a user to index one or more preselected light sources capable of emitting one or more wavelengths to a collimator. Multiple light sources may permit a single apparatus to have the capability of emitting multiple, preselected wavelengths. The multiple light sources permit the user to utilize multiple wavelengths simultaneously to approximate “white light”. One or more of a frequency, intensity, and time of exposure may be selected for the wavelength to be emitted. Thus, the capabilities of the apparatus and method are flexible to meet the needs of the user.
Claims20
A thermal flux processing device, comprising:
- a continuous wave electromagnetic radiation source comprising a plurality of light sources, wherein at least one light source of the plurality of light sources emits electromagnetic radiation at a wavelength different from a second light source of the plurality of light sources;
- a stage positioned to receive a substrate thereon;
- refractive optics disposed between the continuous wave electromagnetic radiation source and the stage, wherein the refractive optics focuses continuous wave electromagnetic radiation from the continuous wave electromagnetic radiation source into a line of continuous wave electromagnetic radiation on an upper surface of the substrate;
- and
- a translation mechanism positioned to translate the continuous wave electromagnetic radiation source relative to the stage.
The thermal flux processing device of 5, wherein the multiple light sources comprise at least one light source that emits near ultraviolet light or at least one light source that emits infrared light.
A thermal flux processing system, comprising:
- a processing chamber;
- a continuous wave electromagnetic radiation source positioned outside of the processing chamber and comprising a plurality of light sources, wherein at least one light source of the plurality of light sources emits electromagnetic radiation at a wavelength different from a second light source of the plurality of light sources;
- a stage positioned within the processing chamber to receive a substrate thereon;
- refractive optics disposed between the continuous wave electromagnetic radiation source and the stage, the refractive optics positioned to focus continuous wave electromagnetic radiation from the continuous wave electromagnetic radiation source into a line of continuous wave electromagnetic radiation on an upper surface of the substrate;
- and
- a translation mechanism positioned to translate the continuous wave electromagnetic radiation source relative to the stage.
A thermal flux processing device, comprising:
- a continuous wave electromagnetic radiation source comprising a plurality of electromagnetic radiation sources, wherein at least one electromagnetic radiation source of the plurality of electromagnetic radiation sources emits electromagnetic radiation at a wavelength different from a second electromagnetic radiation source of the plurality of electromagnetic radiation sources;
- a stage positioned to receive a substrate thereon;
- and
- a translation mechanism positioned to translate the continuous wave electromagnetic radiation source relative to the stage.
Dependencies are inferred from the claim text.