Y10S 430/128
Radiation-activated cross-linking agent containing
Y10S430/128 (Radiation-activated cross-linking agent containing) appears on 197 US grants and 79 published applications in this corpus.
Search patents in Y10S- Granted patents
- 197
- Published applications
- 79
- Assignees
- 82
- Inventors
- 397
- Latest grant
- 5 May 2015
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 1 | 0 |
| 1977 | 2 | 0 |
| 1978 | 1 | 0 |
| 1979 | 1 | 0 |
| 1980 | 3 | 0 |
| 1981 | 9 | 0 |
| 1982 | 4 | 0 |
| 1983 | 4 | 0 |
| 1984 | 6 | 0 |
| 1985 | 5 | 0 |
| 1986 | 10 | 0 |
| 1987 | 6 | 0 |
| 1988 | 3 | 0 |
| 1989 | 6 | 0 |
| 1990 | 4 | 0 |
| 1991 | 1 | 0 |
| 1992 | 0 | 0 |
| 1993 | 3 | 0 |
| 1994 | 3 | 0 |
| 1995 | 3 | 0 |
| 1996 | 4 | 0 |
| 1997 | 1 | 0 |
| 1998 | 4 | 0 |
| 1999 | 8 | 0 |
| 2000 | 7 | 0 |
| 2001 | 12 | 4 |
| 2002 | 8 | 6 |
| 2003 | 7 | 14 |
| 2004 | 9 | 4 |
| 2005 | 7 | 7 |
| 2006 | 4 | 6 |
| 2007 | 6 | 4 |
| 2008 | 3 | 2 |
| 2009 | 4 | 9 |
| 2010 | 6 | 8 |
| 2011 | 10 | 1 |
| 2012 | 7 | 4 |
| 2013 | 2 | 5 |
| 2014 | 5 | 5 |
| 2015 | 8 | 0 |
By publication year. Applications have been published since 2001.
Recent patents
- Photosensitive polymer, resist composition including the photosensitive polymer and method of preparing resist pattern using the resist composition5 May 2015US 9,023,582 B2Samsung Display Co., Ltd.
- Radiation-sensitive composition, and compound5 May 2015US 9,023,584 B2Jsr Corporation
- Negative resist composition and patterning process5 May 2015US 9,023,587 B2Shin-Etsu Chemical Co., Ltd.
- Film, method for manufacturing the film and masking method using the film28 Apr 2015US 9,017,920 B2FIH (Hong Kong) Limited
- Chemically amplified resist composition and patterning process28 Apr 2015US 9,017,922 B2Shin-Etsu Chemical Co., Ltd.
- Negative resist composition and patterning process31 Jul 2014US 2014/0212810 A1Shin-Etsu Chemical Co., Ltd.
- Photosensitive polymer, resist composition including the photosensitive polymer and method of preparing resist pattern using the resist composition22 May 2014US 2014/0141372 A1Samsung Display Co., Ltd.
- Chemically amplified resist composition and patterning process20 Mar 2014US 2014/0080055 A1Shin-Etsu Chemical Co., Ltd.
- Hybrid photoresist composition and pattern forming method using thereof13 Mar 2014US 2014/0072916 A1International Business Machines Corporation
- New compound, photosensitive composition comprising the same and photosensitive material6 Mar 2014US 2014/0065543 A1LG Chem.Ltd.
Most cited
By later US patents
- Photohardenable compositions containing a dye borate complex and photosensitive materials employing the same155US 4,772,541 AThe Mead Corporation · 1988
- Photosensitive materials containing ionic dye compounds as initiators148US 4,772,530 AThe Mead Corporation · 1988
- Silsesquioxane polymers, method of synthesis, photoresist composition, and multilayer lithographic method139US 6,087,064 AInternational Business Machines Corporation · 2000
- Antireflective coating compositions comprising photoacid generators121US 5,939,236 AShipley Company, L.L.C. · 1999
- Patterning process and chemical amplified photoresist with a photodegradable base105US 8,216,767 B2Taiwan Semiconductor Manufacturing Company.Ltd · 2012