Photosensitive polymer, resist composition including the photosensitive polymer and method of preparing resist pattern using the resist composition

A resist composition, comprising:

• a photosensitive polymer including a repeating unit represented by Formula 1 below, the photosensitive polymer having a weight average molecular weight of from about 3,000 to about 50,000;
• a photoacid generator;
• and
• a solvent:
• wherein, in Formula 1,
• Ar1 is selected from among:
• a C3-C10 cycloalkylene group, a C3-C10 cycloalkenylene group, a C2-C10 heterocycloalkylene group, a C2-C10 heterocycloalkenylene group, a C6-C20 arylene group, and a C2-C20 heteroarylene group, and
• a C3-C10 cycloalkylene group, a C3-C10 cycloalkenylene group, a C2-C10 heterocycloalkylene group, a C2-C10 heterocycloalkenylene group, a C6-C20 arylene group, and a C2-C20 heteroarylene group that are substituted with at least one of a deuterium atom, a halogen atom, a hydroxyl group, a cyano group, a nitro group, an amino group, an amidino group, a hydrazine, a hydrazone, a carboxylic group or a salt thereof, a sulfonic acid group or a salt thereof, a phosphoric acid group or a salt thereof, a C1-C20 alkyl group, a C1-C20 alkoxy group, a C3-C10 cycloalkyl group, a C3-C10 cycloalkenyl group, a C2-C10 heterocycloalkyl group, a C2-C10 heterocycloalkenyl group, a C6-C20 aryl group, and a C2-C20 heteroaryl group;
• Ar2 is selected from among:
• —C(═O)—, —O—, a C1-C20 alkylene group, a C3-C10 cycloalkylene group, a C3-C10 cycloalkenylene group, a C2-C10 heterocycloalkylene group, a C2-C10 heterocycloalkenylene group, a C6-C20 arylene group, and a C2-C20heteroarylene group, and
• a C3-C10 cycloalkylene group, a C3-C10 cycloalkenylene group, a C2-C10 heterocycloalkylene group, a C2-C10 heterocycloalkenylene group, a C6-C20 arylene group, and a C2-C20 heteroarylene group that are substituted with at least one of a deuterium atom, a halogen atom, a hydroxyl group, a cyano group, a nitro group, an amino group, an amidino group, a hydrazine, a hydrazone, a carboxylic group or a salt thereof, a sulfonic acid group or a salt thereof, a phosphoric acid group or a salt thereof, a C1-C20 alkyl group, a C1-C20 alkoxy group, a C3-C10 cycloalkyl group, a C3-C10 cycloalkenyl group, a C2-C10 heterocycloalkyl group, a C2-C10 heterocycloalkenyl group, a C6-C20 aryl group, and a C2-C20 heteroaryl group;
• a and b are each independently an integer from 1 to 5, provided that:
• when a is 2 or greater, the Ar1 in (Ar1)a are the same or different from each other, and
• when b is 2 or greater, the Ar2 in (Ar2)b are the same or different from each other;
• and
• R1 to R4 are each independently selected from among:
• a hydrogen atom, a deuterium atom, a halogen atom, a hydroxyl group, a cyano group, a nitro group, an amino group, an amidino group, a hydrazine, a hydrazone, a carboxylic group or a salt thereof, a sulfonic acid group or a salt thereof, a phosphoric acid group or a salt thereof, a C1-C20 alkyl group, and a C1-C20 alkoxy group,
• a C1-C20 alkyl group and a C1-C20 alkoxy group that are substituted with at least one of a deuterium atom, a halogen atom, a hydroxyl group, a cyano group, a nitro group, an amino group, an amidino group, a hydrazine, a hydrazone, a carboxylic group or a salt thereof, a sulfonic acid group or a salt thereof, a phosphoric acid group or a salt thereof, a C6-C20 aryl group, and a C2-C20 heteroaryl group;
• a C3-C10 cycloalkyl group, a C3-C10 cycloalkenyl group, a C3-C10 heterocycloalkyl group, a C3-C10 heterocycloalkenyl group, a C6-C60 aryl group, a C6-C60 aryloxy group, a C6-C60 arylthio group, and a C2-C60 heteroaryl group, and
• a C3-C10 cycloalkyl group, a C3-C10 cycloalkenyl group, a C3-C10 heterocycloalkyl group, a C3-C10 heterocycloalkenyl group, a C6-C60 aryl group, a C6-C60 aryloxy group, a C6-C60 arylthio group, and a C2-C60 heteroaryl group that are substituted with at least one of a deuterium atom, a halogen atom, a hydroxyl group, a cyano group, a nitro group, an amino group, an amidino group, a hydrazine, a hydrazone, a carboxylic group or a salt thereof, a sulfonic acid group or a salt thereof, a phosphoric acid group or a salt thereof, a C1-C20 alkyl group, and a C1-C20 alkoxy group.