Film, method for manufacturing the film and masking method using the film

A method for manufacturing a film, comprising:

• providing a base;
• providing a first photosensitive agent, a second photosensitive agent, and a thermosol, the first photosensitive agent being water-soluble, the second photosensitive agent being aromatic ketone compound or benzoin ether compound, the mass percentage of the first photosensitive agent in the photosensitive layer being about 80% to about 90%;
• dissolving the second photosensitive agent in deionized water, the first photosensitive agent and the thermosol being added to the deionized water to create a colloid, the colloid being stirred and heated to dissolve the colloid to form a photosensitive adhesive;
• forming a photosensitive layer on the base by coating the photosensitive adhesive to the base.

A masking method using a film, comprising:

• providing a substrate;
• providing a film, the film comprising a base and a photosensitive layer formed on the base, the photosensitive layer substantially comprising a first photosensitive agent, a second photosensitive agent, and a thermosol, the first photosensitive agent being water-soluble, the second photosensitive agent being an aromatic ketone compound or a benzoin ether compound, the mass percentage of the first photosensitive agent in the photosensitive layer being about 80% to about 90%;
• a hard layer and a soluble layer being formed on the base by exposing and developing the film, the soluble layer being removed form the base;
• softening the thermosol of the hard layer and pasting the film to the substrate, the hard layer being bonded to the substrate, and then the base being split to form the hard layer.