Y10S 156/916
Differential etching apparatus including chamber cleaning means or shield for preventing deposits
Y10S156/916 (Differential etching apparatus including chamber cleaning means or shield for preventing deposits) appears on 136 US grants and 38 published applications in this corpus.
Search patents in Y10S- Granted patents
- 136
- Published applications
- 38
- Assignees
- 46
- Inventors
- 268
- Latest grant
- 10 Mar 2015
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1985 | 1 | 0 |
| 1986 | 0 | 0 |
| 1987 | 1 | 0 |
| 1988 | 1 | 0 |
| 1989 | 2 | 0 |
| 1990 | 0 | 0 |
| 1991 | 1 | 0 |
| 1992 | 4 | 0 |
| 1993 | 5 | 0 |
| 1994 | 7 | 0 |
| 1995 | 6 | 0 |
| 1996 | 4 | 0 |
| 1997 | 7 | 0 |
| 1998 | 7 | 0 |
| 1999 | 15 | 0 |
| 2000 | 16 | 0 |
| 2001 | 20 | 4 |
| 2002 | 6 | 4 |
| 2003 | 5 | 6 |
| 2004 | 3 | 7 |
| 2005 | 2 | 6 |
| 2006 | 9 | 2 |
| 2007 | 3 | 3 |
| 2008 | 2 | 4 |
| 2009 | 2 | 0 |
| 2010 | 2 | 0 |
| 2011 | 1 | 1 |
| 2012 | 1 | 1 |
| 2013 | 0 | 0 |
| 2014 | 1 | 0 |
| 2015 | 2 | 0 |
By publication year. Applications have been published since 2001.
Recent patents
- Deposit protection cover and plasma processing apparatus10 Mar 2015US 8,974,600 B2Tokyo Electron Limited
- Plasma processing apparatus and plasma processing method24 Feb 2015US 8,960,124 B2Mitsubishi Heavy Industries, Ltd.
- Semiconductor manufacturing equipment and manufacturing method of the same12 Aug 2014US 8,801,895 B2Spansion LLC
- Apparatus for an improved deposition shield in a plasma processing system21 Feb 2012US 8,117,986 B2Tokyo Electron Limited
- Semiconductor device fabricating system5 Jul 2011US 7,972,468 B2Tokyo Electron Limited
- Plasma processing apparatus and plasma processing method24 May 2012US 2012/0125891 A1Mitsubishi Heavy Industries, Ltd.
- Deposit protection cover and plasma processing apparatus3 Feb 2011US 2011/0024040 A1Tokyo Electron Limited
- Particle-removing apparatus for a semiconductor device manufacturing apparatus and method of removing particles25 Sep 2008US 2008/0233756 A1
- Semiconductor manufacturing equipment and manufacturing method of the same4 Sep 2008US 2008/0210170 A1Spansion LLC
- Method of refurbishing a magnet assembly for plasma process chamber20 Mar 2008US 2008/0066785 A1Applied Materials, Inc.
Most cited
By later US patents
- Dilute remote plasma clean676US 6,329,297 B1APPLIED Materials.Inc. · 2001
- Focus ring for semiconductor wafer processing in a plasma reactor469US 5,685,914 AAPPLIED Materials.Inc. · 1997
- Multi-zone plasma processing method and apparatus454US 5,252,178 ATexas Instruments Incorporated · 1993
- Method and apparatus for protection of conductive surfaces in a plasma processing reactor319US 5,366,585 AAPPLIED Materials.Inc. · 1994
- Vacuum processing apparatus239US 5,647,945 ATokyo Electron Limited · 1997