Vacuum processing apparatus
AssigneeTokyo Electron Limited
InventorsKimihiro Matsuse, Hideki Lee, Hatsuo Osada, Sumi Tanaka
Life of this patent
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Abstract
A vacuum processing apparatus includes: a vacuum processing chamber for processing a target object; a processing gas supply source for supplying a processing gas by which a process is performed to the target object in the vacuum processing chamber; a processing gas supply pipe for supplying the processing gas from the processing gas supply source into the vacuum processing chamber; and a pressure reducing valve for keeping the gas supply pipe at a lower pressure than the atmospheric pressure when the processing gas is to be supplied to the vacuum processing chamber.
Claims2
A vacuum processing apparatus comprising:
- a vacuum processing chamber for processing a target object;
- a processing gas supply source for supplying a processing gas by which a process is performed to the target object in said vacuum processing chamber;
- a cleaning gas supply source for supplying a cleaning gas containing ClF.sub.3 gas for cleaning the interior of said vacuum processing chamber;
- a processing gas supply pipe for supplying the processing gas from said processing gas supply source into said vacuum processing chamber;
- a cleaning gas supply pipe for supplying said cleaning gas from said cleaning gas supply source to said vacuum processing chamber;
- and
- a pressure reducing valve for keeping said cleaning gas supply pipe at a lower pressure than the atmospheric pressure when the cleaning gas is to be supplied to said vacuum processing chamber.
Dependencies are inferred from the claim text.