Y10S 148/019
Contacts of silicides
Y10S148/019 (Contacts of silicides) appears on 145 US grants and 0 published applications in this corpus.
Search patents in Y10S- Granted patents
- 145
- Published applications
- 0
- Assignees
- 60
- Inventors
- 222
- Latest grant
- 2 May 2006
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1981 | 2 | 0 |
| 1982 | 0 | 0 |
| 1983 | 0 | 0 |
| 1984 | 2 | 0 |
| 1985 | 3 | 0 |
| 1986 | 15 | 0 |
| 1987 | 7 | 0 |
| 1988 | 7 | 0 |
| 1989 | 12 | 0 |
| 1990 | 10 | 0 |
| 1991 | 15 | 0 |
| 1992 | 12 | 0 |
| 1993 | 11 | 0 |
| 1994 | 12 | 0 |
| 1995 | 17 | 0 |
| 1996 | 9 | 0 |
| 1997 | 1 | 0 |
| 1998 | 7 | 0 |
| 1999 | 1 | 0 |
| 2000 | 1 | 0 |
| 2001 | 0 | 0 |
| 2002 | 0 | 0 |
| 2003 | 0 | 0 |
| 2004 | 0 | 0 |
| 2005 | 0 | 0 |
| 2006 | 1 | 0 |
By publication year. Applications have been published since 2001.
Recent patents
- Method for fabricating semiconductor device2 May 2006US 7,037,371 B1Matsushita Electric Industrial Co., Ltd.
- Method for fabricating semiconductor device with polycide structure for electrode or interconnect13 Jun 2000US 6,074,925 ANEC Corporation
- Manufacturing method for self-aligned local interconnects and contacts simultaneously4 May 1999US 5,899,742 A
- Method of filling a contact hole in a semiconductor device using vertical growth of metal17 Nov 1998US 5,837,608 AHyundai Electronics Industries Co., Ltd.
- Raised silicided source/drain electrode formation with reduced substrate silicon consumption3 Nov 1998US 5,830,775 ASharp Kabushiki Kaisha
No published applications in this class yet.
Most cited
By later US patents
- Method of producing titanium nitride MOS device gate electrode640US 4,570,328 AMotorola, Inc. · 1986
- Uniform tungsten silicide films produced by chemical vapor deposition251US 5,500,249 AAPPLIED Materials.Inc. · 1996
- Tungsten silicide (WSi.sub.x) deposition process for semiconductor manufacture113US 5,231,056 AMicron Technology, Inc. · 1993
- Process for fabricating an integrated circuit using local silicide interconnection lines99US 5,187,122 AFrance Telecom Establissement Autonome de Droit Public · 1993
- Method of fabricating a polycidegate employing nitrogen/oxygen implantation89US 4,897,368 AMatsushita Electric Industrial Co., Ltd. · 1990