patentgrep
SearchCompaniesTechnologiesAPIPricingDocs
DocsGet an API key
  1. Technology classes
  2. /H · Electricity
  3. /H10 · Semiconductor devices
  4. /H10P · Generic processes or apparatus for the manufacture or treatment of devices covered
  5. /H10P 14/00 · Formation of materials
  6. /H10P 14/40 · Formation of materials: of conductive or resistive materials
  7. /H10P 14/46 · Using a liquid
  8. /H10P 14/47 · Electrolytic deposition, i.e. electroplating
  9. /H10P 14/48
H10P 14/48

Electroless plating

Official title: {Electroless plating}

H10P14/48 (Electroless plating) appears on 1 US grants and 4 published applications in this corpus.

Search patents in H10P

Where it sits

  1. HElectricity
  2. H10Semiconductor devices
  3. H10PGeneric processes or apparatus for the manufacture or treatment of devices covered
  4. H10P 14/00Formation of materials
  5. H10P 14/40Formation of materials: of conductive or resistive materials
  6. H10P 14/46Using a liquid
  7. H10P 14/47Electrolytic deposition, i.e. electroplating
  8. H10P 14/48Electroless plating
Granted patents
1
Published applications
4
Assignees
5
Inventors
9
Latest grant
12 Nov 2002

Filings by year

Granted patentsPublished applications
H10P 14/48: granted patents and published applications per publication year
YearGranted patentsPublished applications
200101
200210
200300
200400
200500
200600
200700
200800
200900
201000
201100
201200
201300
201400
201500
201600
201700
201800
201900
202000
202100
202200
202300
202400
202500
202603

2001201120212026

By publication year. 2026 runs to 8 Oct.

Recent patents

  • Process for fabricating a semiconductor device12 Nov 2002US 6,479,384 B2Sony Corporation
  • Substrate liquid processing method and substrate liquid processing apparatus27 Aug 2026US 2026/0255892 A1Tokyo Electron Limited
  • Surface treatment method for silicon body and method of manufacturing silicon structural body6 Aug 2026US 2026/0231700 A1Nagano Prefecture
  • Method for processing insulation layer, method for producing redistribution layer, and processing apparatus11 Jun 2026US 2026/0165150 A1Panasonic Intellectual Property Management Co., Ltd.
  • Process for fabricating a semiconductor device6 Sep 2001US 2001/0019892 A1Sony Corporation

Most cited

By later US patents
  • Process for fabricating a semiconductor device20US 6,479,384 B2Sony Corporation · 2002

Top assignees

Documents
  • Sony Corporation2
  • NPNagano Prefecture1
  • PIPanasonic Intellectual Property Management Co., Ltd.1
  • TTakano Co., Ltd.1
  • Tokyo Electron Limited1

Often classified with

  • H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by4
  • C23CCoating metallic material2
  • B81CProcesses or apparatus specially adapted for the manufacture or treatment of microstructural1

Documents that also carry the other class.

patentgrep

Search every US patent grant since 1976 and every published application since 2001. Updated weekly from USPTO.

Product

  • Search
  • New this week
  • Where the data comes from
  • Pricing

Browse

  • Companies
  • Technology classes

Developers

  • API docs
  • PatentsView-compatible API
  • MCP server
  • Changelog

About

  • Privacy
  • Terms
© 2026 patentgrepData from USPTO bulk files