H10N 60/0296
Processes for depositing or forming copper oxide superconductor layers
Official title: {Processes for depositing or forming copper oxide superconductor layers}
H10N60/0296 (Processes for depositing or forming copper oxide superconductor layers) appears on 1,109 US grants and 625 published applications in this corpus.
Search patents in H10N- Granted patents
- 1,109
- Published applications
- 625
- Assignees
- 384
- Inventors
- 1,687
- Latest grant
- 8 Sep 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1989 | 14 | 0 |
| 1990 | 53 | 0 |
| 1991 | 76 | 0 |
| 1992 | 84 | 0 |
| 1993 | 89 | 0 |
| 1994 | 69 | 0 |
| 1995 | 45 | 0 |
| 1996 | 33 | 0 |
| 1997 | 30 | 0 |
| 1998 | 25 | 0 |
| 1999 | 36 | 0 |
| 2000 | 33 | 0 |
| 2001 | 31 | 4 |
| 2002 | 25 | 29 |
| 2003 | 41 | 36 |
| 2004 | 33 | 46 |
| 2005 | 17 | 41 |
| 2006 | 8 | 42 |
| 2007 | 18 | 30 |
| 2008 | 14 | 26 |
| 2009 | 23 | 35 |
| 2010 | 31 | 31 |
| 2011 | 32 | 34 |
| 2012 | 28 | 28 |
| 2013 | 22 | 25 |
| 2014 | 24 | 17 |
| 2015 | 23 | 26 |
| 2016 | 14 | 23 |
| 2017 | 12 | 10 |
| 2018 | 12 | 24 |
| 2019 | 15 | 10 |
| 2020 | 14 | 16 |
| 2021 | 8 | 21 |
| 2022 | 21 | 23 |
| 2023 | 13 | 14 |
| 2024 | 15 | 13 |
| 2025 | 19 | 10 |
| 2026 | 9 | 11 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
- H10N 60/0576Characterised by the substrate524
- H10N 60/0548By deposition and subsequent treatment156
- H10N 60/0324From a solution123
- H10N 60/0521By pulsed laser deposition100
- H10N 60/0408By sputtering98
- H10N 60/0381By evaporation84
- H10N 60/0436By chemical vapour deposition [cvd]80
- H10N 60/0352From a suspension or slurry47
All 9 subgroupsShow fewer
Recent patents
- Circuit manufacturing method and superconducting circuit8 Sep 2026US 12,733,407 B2NEC Corporation
- Multi-stack susceptor reactor for high-throughput superconductor manufacturing1 Sep 2026US 12,727,392 B2MetOx International, Inc.
- Method for manufacture of nanostructure electrical devices2 Jun 2026US 12,648,196 B2University of Copenhagen
- Electro-formed metal foils19 May 2026US 12,635,422 B2American Superconductor Corporation
- Thin film having single-crystal-level crystal orientation property, method for manufacturing same, and product using same7 Apr 2026US 12,598,921 B2Korea Electrotechnology Research Institute
- Electro-formed metal foils10 Sep 2026US 2026/0271625 A1American Superconductor Corporation
- Deposition apparatus for superconductor16 Jul 2026US 2026/0201544 A1Maru L&C Co., Ltd.
- Highly-textured thin films9 Jul 2026US 2026/0198128 A1University of Houston System
- Thin film having single-crystal-level crystal orientation property, and method for manufacturing same9 Jul 2026US 2026/0198231 A1Korea Electrotechnology Research Institute
- Superconductor flux pinning without columnar defects2 Jul 2026US 2026/0190867 A1MetOx International, Inc.
Most cited
By later US patents
- Crystal compensated superconducting thin film formed of oxide superconductor material535US 5,430,011 ASumitomi Electric Industries, Ltd. · 1995
- Apparatus and method for delivering reagents in vapor form to a CVD reactor, incorporating a cleaning subsystem368US 5,362,328 AAdvanced Technology Materials, Inc. · 1994
- Method of forming single-crystalline thin film281US 5,607,899 ASumitomo Electric Industries, Ltd. · 1997
- Method for delivering an involatile reagent in vapor form to a CVD reactor246US 5,204,314 AAdvanced Technology Materials, Inc. · 1993
- Substrate structures for electronic devices212US 6,045,626 ATDK Corporation · 2000