Apparatus and method for delivering reagents in vapor form to a CVD reactor, incorporating a cleaning subsystem

An apparatus for vaporizing a source reagent of non-vapor character, to produce a vapor for transport to a locus of use in a downstream deposition chamber, said apparatus comprising:

• a vaporization chamber including a housing defining therewithin an enclosed interior vaporization volume;
• means for feeding source reagent to the interior volume of the housing;
• vaporization means disposed within the interior volume of said housing and in receiving relationship to the feed means, for receiving source reagent and effecting vaporization thereof;
• and
• a downstream deposition chamber joined in vaporized reagent flow relationship to the vaporization chamber housing;
• means for automatically selectively feeding to the interior volume, for contact with the vaporization means and interior surfaces of the housing, a cleaning fluid which is cleaningly effective to at least partially remove vaporization deposits from said vaporization means and interior surfaces of the housing;
• wherein the flow of cleaning fluid, source fluid, and vaporized reagent are selectively controlled with automatic flow control means of a selectively automatically actuatable character.

A method of vaporizing a non-vapor source reagent for subsequent use of the vaporized reagent in a downstream deposition chamber, and at least partially removing decomposition by-products of such vaporization, said process comprising:

• (a) providing an apparatus for vaporizing a source reagent of non-vapor character, to produce a vapor for transport to a locus of use, for deposition in the downstream deposition chamber, said apparatus comprising:
• (i) a vaporization chamber including a housing defining therewithin an enclosed interior vaporization volume;
• (ii) means for feeding source reagent to the interior volume of the housing;
• (iii) vaporization means disposed within the interior volume of said housing and in receiving relationship to the feed means, for receiving source reagent and effecting vaporization thereof;
• (iv) a downstream deposition chamber to which the vaporization chamber housing is joined in vaporized reagent flow relationship;
• (v) means for selectively feeding to the interior volume, for contact with the vaporization means and interior surfaces of the housing, a cleaning fluid which is cleaningly effective to at least partially remove vaporization deposits from said vaporization means and interior surfaces of the housing;
• wherein the flow of cleaning fluid, source reagent, and vaporized reagent are selectively controlled with flow control means of a selectively actuatable character, and wherein the cleaning fluid feeding means and said flow control means are constructed and arranged to be operated while the vaporization chamber housing remains connected to the downstream deposition chamber;
• (b) vaporizing the source reagent in the housing for a predetermined time, and flowing resulting vaporized reagent out of the housing and to the downstream deposition chamber;
• and
• (c) after said predetermined time, terminating flow of source reagent and vaporized reagent, and flowing into said housing a cleaning fluid which is cleaningly effective for at least partial removal of deposits produced by said vaporization, while said vaporization housing chamber remains connected to the downstream deposition chamber.