H10N 60/0436
By chemical vapour deposition [cvd]
Official title: {by chemical vapour deposition [CVD]}
H10N60/0436 (By chemical vapour deposition [cvd]) appears on 80 US grants and 69 published applications in this corpus.
Search patents in H10N- Granted patents
- 80
- Published applications
- 69
- Assignees
- 55
- Inventors
- 193
- Latest grant
- 1 Sep 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1990 | 3 | 0 |
| 1991 | 2 | 0 |
| 1992 | 8 | 0 |
| 1993 | 7 | 0 |
| 1994 | 8 | 0 |
| 1995 | 4 | 0 |
| 1996 | 1 | 0 |
| 1997 | 0 | 0 |
| 1998 | 3 | 0 |
| 1999 | 1 | 0 |
| 2000 | 2 | 0 |
| 2001 | 0 | 0 |
| 2002 | 0 | 1 |
| 2003 | 2 | 1 |
| 2004 | 2 | 11 |
| 2005 | 1 | 3 |
| 2006 | 1 | 4 |
| 2007 | 1 | 1 |
| 2008 | 1 | 1 |
| 2009 | 1 | 0 |
| 2010 | 0 | 1 |
| 2011 | 2 | 2 |
| 2012 | 4 | 5 |
| 2013 | 1 | 0 |
| 2014 | 3 | 0 |
| 2015 | 0 | 6 |
| 2016 | 0 | 3 |
| 2017 | 1 | 0 |
| 2018 | 2 | 4 |
| 2019 | 1 | 1 |
| 2020 | 2 | 3 |
| 2021 | 1 | 3 |
| 2022 | 4 | 5 |
| 2023 | 2 | 4 |
| 2024 | 3 | 4 |
| 2025 | 3 | 3 |
| 2026 | 3 | 3 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
Recent patents
- Multi-stack susceptor reactor for high-throughput superconductor manufacturing1 Sep 2026US 12,727,392 B2MetOx International, Inc.
- Superconductor flux pinning without columnar defects31 Mar 2026US 12,593,617 B2MetOx International, Inc.
- Susceptor for a chemical vapor deposition reactor24 Mar 2026US 12,588,426 B2MetOx International, Inc.
- Enhanced NB3SN surfaces for superconducting cavities30 Dec 2025US 12,513,813 B2Fermi Forward Discovery Group, LLC
- Methods and systems for manufacturing semiconductor devices18 Mar 2025US 12,253,483 B1Psiquantum, Corp.
- Superconductor flux pinning without columnar defects2 Jul 2026US 2026/0190867 A1MetOx International, Inc.
- Articles with metal-doped superconducting layer formed by laser-induced metal ion implantation28 May 2026US 2026/0150588 A1Corning Incorporated
- Superconducting cavity smoothness14 May 2026US 2026/0136450 A1Fermi Forward Discovery Group, LLC
- Superconductor flux pinning without columnar defects11 Dec 2025US 2025/0380618 A1MetOx International, Inc.
- Uniform coating of a surface3 Jul 2025US 2025/0215554 A1
Most cited
By later US patents
- Apparatus and method for delivering reagents in vapor form to a CVD reactor, incorporating a cleaning subsystem368US 5,362,328 AAdvanced Technology Materials, Inc. · 1994
- Method for delivering an involatile reagent in vapor form to a CVD reactor246US 5,204,314 AAdvanced Technology Materials, Inc. · 1993
- Metal complex source reagents for MOCVD189US 5,453,494 AAdvanced Technology Materials, Inc. · 1995
- Apparatus for flash vaporization delivery of reagents189US 5,536,323 AAdvanced Technology Materials, Inc. · 1996
- Method of forming metal films on a substrate by chemical vapor deposition189US 6,110,529 A2000