Susceptor for a chemical vapor deposition reactor
AssigneeMetOx International, Inc.
InventorsShahab Khandan, Alex Ignatiev, Mikhail Novozhilov, W. James Jewitt
Life of this patent
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Abstract
A susceptor used in a deposition reactor provides heat input and controls the build-up of errant deposition. The susceptor heats a substrate tape within the reactor upon which one or more thin films are deposited, particularly high temperature superconductor (HTS) thin films produced in a MOCVD reactor.
Claims19
A susceptor system (200) for heating and temperature control of a substrate tape (120) and for the control of errant deposition build-up (180) within a deposition apparatus, the susceptor system (200) comprising:
- a susceptor;
- a substrate tape disposed above and in contact with the susceptor;
- a main body (210) forming a base of the susceptor (200);
- and
- two or more adjacent raised sections (220) each extending vertically from the upper surface of the main body (210) and lengthwise along the length of the main body (210) with the top (224) of each raised section having a width substantially the same or less than the width of the substrate tape (120),
- wherein each raised section (220) is separated by a gap (230) from an adjacent raised section (220), and
- wherein the gap (230) separating adjacent raised sections (220) forms a channel (240) to collect errant deposition material (180).
A susceptor system (610) for heating and temperature control of a substrate tape (120) and for the control of errant deposition build-up (180) within a deposition apparatus, the susceptor system (610) comprising:
- a susceptor;
- a substrate tape disposed above and in contact with the susceptor;
- a main body (210) forming a base of the susceptor (610);
- and
- two or more adjacent raised sections (220) each extending vertically from the upper surface of the main body (210) and lengthwise along the length of the main body (210),
- wherein the top (224) of each raised section (220) further comprises two or more support ridges (620) configured to elevate substrate tape (120) such that the bottom of said substrate tape (120) does not contact the raised section (220) top surface (630), and
- wherein the distance between outermost edges of two support ridges (620) of each raised section (220) is substantially the same or less than the width of the substrate tape (120), and
- wherein each raised section (220) is separated by a gap (230) from an adjacent raised section (220), and
- wherein the gap (230) separating adjacent raised sections (220) forms a channel (240) to collect errant deposition material (180).
A susceptor system (600) for heating and temperature control of a substrate tape (120) within a deposition apparatus, the susceptor system (600) comprising:
- a susceptor;
- a substrate tape disposed above and in contact with the susceptor;
- a main body (210) forming a base of the susceptor (600);
- and
- two or more support ridges (620) located on the upper surface of the main body and are configured to elevate the substrate tape (120) such that the bottom of said substrate tape (120) does not contact the upper surface of the main body of the susceptor (600).
A system (800) for heating and temperature control of a substrate tape (120) and control of errant deposition build-up (180) within a chemical vapor deposition apparatus, the system (800) comprising:
- a chemical vapor deposition apparatus (810) comprising a reactor housing (820) having an inlet (830) for a precursor (834) and a vacuum exhaust (840);
- a susceptor (200/600/610) located within the reactor housing (820);
- a substrate tape (120) configured to translate along the top the susceptor (200/610) and through the reactor housing (820);
- a heater (850) operatively coupled to the susceptor (200/600/610);
- wherein the susceptor further comprises a main body (210) and at least one raised section (220) extending vertically from the upper surface of the main body (210) and lengthwise along the length of the main body (210) with the top (224) of each raised section having a width substantially the same or less than the width of the substrate tape (120);
- and
- wherein the susceptor (200/600/610) further comprises a channel (240) configured for collection of errant deposition build-up (180).
Dependencies are inferred from the claim text.