H01J 37/32275
Microwave reflectors
Official title: {Microwave reflectors}
H01J37/32275 (Microwave reflectors) appears on 39 US grants and 27 published applications in this corpus.
Search patents in H01J- Granted patents
- 39
- Published applications
- 27
- Assignees
- 20
- Inventors
- 93
- Latest grant
- 26 May 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1985 | 2 | 0 |
| 1986 | 2 | 0 |
| 1987 | 2 | 0 |
| 1988 | 2 | 0 |
| 1989 | 0 | 0 |
| 1990 | 2 | 0 |
| 1991 | 2 | 0 |
| 1992 | 2 | 0 |
| 1993 | 0 | 0 |
| 1994 | 1 | 0 |
| 1995 | 0 | 0 |
| 1996 | 2 | 0 |
| 1997 | 1 | 0 |
| 1998 | 0 | 0 |
| 1999 | 0 | 0 |
| 2000 | 0 | 0 |
| 2001 | 0 | 0 |
| 2002 | 0 | 0 |
| 2003 | 0 | 0 |
| 2004 | 0 | 4 |
| 2005 | 1 | 2 |
| 2006 | 0 | 0 |
| 2007 | 3 | 1 |
| 2008 | 0 | 2 |
| 2009 | 2 | 0 |
| 2010 | 1 | 0 |
| 2011 | 1 | 2 |
| 2012 | 1 | 0 |
| 2013 | 0 | 1 |
| 2014 | 0 | 0 |
| 2015 | 1 | 1 |
| 2016 | 0 | 0 |
| 2017 | 1 | 0 |
| 2018 | 0 | 1 |
| 2019 | 0 | 1 |
| 2020 | 0 | 1 |
| 2021 | 1 | 2 |
| 2022 | 3 | 4 |
| 2023 | 3 | 2 |
| 2024 | 1 | 0 |
| 2025 | 1 | 3 |
| 2026 | 1 | 0 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Electromagnetic wave supply mechanism and plasma processing apparatus26 May 2026US 12,640,347 B2Tokyo Electron Limited
- Plasma processing apparatus and plasma processing method21 Jan 2025US 12,205,800 B2Tokyo Electron Limited
- Plasma processing apparatus30 Jan 2024US 11,887,816 B2Tokyo Electron Limited
- Apparatus for plasma processing9 May 2023US 11,646,178 B2Tokyo Electron Limited
- Microwave output device and plasma processing apparatus21 Feb 2023US 11,587,769 B2Tokyo Electron Limited
- Plasma generator and cooling jacket7 Aug 2025US 2025/0253136 A1HORIBA STEC, Co., Ltd.
- Plasma processing apparatus and heating apparatus10 Apr 2025US 2025/0118537 A1Hitachi High-Tech Corporation
- Electromagnetic wave supply mechanism and plasma processing apparatus13 Mar 2025US 2025/0087463 A1Tokyo Electron Limited
- Apparatus for treating substrate and method for operating thereof20 Apr 2023US 2023/0120716 A1Semes Co., Ltd.
- Plasma processing apparatus and plasma processing method6 Apr 2023US 2023/0106303 A1Tokyo Electron Limited
Most cited
By later US patents
- Plasma deposited coatings, and low temperature plasma method of making same289US 4,737,379 AEnergy Conversion Devices, Inc. · 1988
- Method of making amorphous semiconductor alloys and devices using microwave energy92US 4,504,518 AEnergy Conversion Devices, Inc. · 1985
- Method of depositing semiconductor films by free radical generation81US 4,615,905 ASovonics Solar Systems · 1986
- Method of making amorphous semiconductor alloys and devices using microwave energy63US 4,517,223 ASovonics Solar Systems · 1985
- High-speed film forming method by microwave plasma chemical vapor deposition (CVD) under high pressure39US 5,037,666 AUha Mikakuto Precision Engineering Research Institute Co., Ltd. · 1991