Plasma processing apparatus and plasma processing method
AssigneeTokyo Electron Limited
InventorsTaro Ikeda, Haruhiko Furuya
Life of this patent
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Abstract
A plasma processing apparatus includes: a chamber; a stage provided in the chamber; a microwave transmission window provided on a wall surface of the chamber; a microwave supply configured to supply microwaves into the chamber via the microwave transmission window; a shower plate configured to partition an interior of the chamber into a plasma generation space, which is a region where the microwave transmission window is disposed, and a processing space, which is a region where the stage is disposed; and a protrusion protruding from the shower plate into the plasma generation space and including a conductor in at least a portion of the protrusion.
Claims15
A plasma processing apparatus comprising:
- a chamber;
- a stage provided in the chamber;
- a microwave transmission window provided on a wall surface of the chamber;
- a microwave supply configured to supply microwaves into the chamber via the microwave transmission window;
- a shower plate configured to partition an interior of the chamber into a plasma generation space, which is a region where the microwave transmission window is disposed, and a processing space, which is a region where the stage is disposed;
- and
- a protrusion protruding from the shower plate toward the microwave transmission window, disposed in the plasma generation space, and including a conductor in at least a portion of the protrusion,
- wherein the protrusion is configured to function as a plasma ignition source and to generate standing waves between the microwave transmission window and the protrusion.
Dependencies are inferred from the claim text.