Apparatus for treating substrate and method for operating thereof
AssigneeSemes Co., Ltd.
InventorsYoon Seok CHOI, Yun Sang KIM, Soon-Cheon CHO, Sang Jeong LEE, Jong Won PARK, Hyun Woo JO
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Abstract
The inventive concept provides a substrate treating apparatus. The substrate treating apparatus includes a plurality of process chambers for performing a first process using a microwave energy; one microwave generator for generating a microwave; a wave guide connecting to each of the plurality of process chambers and the microwave generator; and a microwave path changing member provided at a microwave transfer path of the wave guide and changing the microwave transfer path of one chosen chamber among the plurality of process chambers.
Claims14
A substrate treating apparatus comprising:
- a plurality of process chambers for performing a first process using a microwave energy;
- one microwave generator for generating a microwave;
- a wave guide connecting to each of the plurality of process chambers and the microwave generator;
- and
- a microwave path changing member provided at a microwave transfer path of the wave guide and changing the microwave transfer path of one chosen chamber among the plurality of process chambers.
-17. (canceled)
A substrate treating apparatus comprising:
- a plurality of process chambers for performing a first process using a microwave energy;
- one microwave generator for generating a microwave;
- a wave guide including a main wave guide, a plurality of branch wave guides branching from the main wave guide and transferring the microwave corresponding to each of the plurality of process chambers, and connecting each of the plurality of process chambers and the microwave generator;
- a microwave path changing member provided in a plurality, provided at each inlet of the plurality of branch wave guides, and which opens and closes an inlet of the branch wave guide so change a microwave transfer path of one chosen chamber among the plurality of process chambers;
- and
- a controller, and
- wherein the first process is a process of treating a substrate using the microwave or a process of treating the substrate using a plasma generated from a process gas by the microwave, and
- the controller controls the microwave generator and the microwave path changing member so the plurality of process chambers perform the first process at different times, and so the microwave is transmitted to the one chosen chamber from any one chamber among the plurality of process chamber while the first process is being performed.
Dependencies are inferred from the claim text.