Plasma processing apparatus and plasma processing method
AssigneeTokyo Electron Limited
InventorsTaro IKEDA, Haruhiko FURUYA
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Abstract
A plasma processing apparatus includes: a chamber; a stage provided in the chamber; a microwave transmission window provided on a wall surface of the chamber; a microwave supply configured to supply microwaves into the chamber via the microwave transmission window; a shower plate configured to partition an interior of the chamber into a plasma generation space, which is a region where the microwave transmission window is disposed, and a processing space, which is a region where the stage is disposed; and a protrusion protruding from the shower plate into the plasma generation space and including a conductor in at least a portion of the protrusion.
Claims17
A plasma processing apparatus comprising:
- a chamber;
- a stage provided in the chamber;
- a microwave transmission window provided on a wall surface of the chamber;
- a microwave supply configured to supply microwaves into the chamber via the microwave transmission window;
- a shower plate configured to partition an interior of the chamber into a plasma generation space, which is a region where the microwave transmission window is disposed, and a processing space, which is a region where the stage is disposed;
- and
- a protrusion protruding from the shower plate into the plasma generation space and including a conductor in at least a portion of the protrusion.
Dependencies are inferred from the claim text.