H01J 37/305
For casting, melting, evaporating, or etching
Official title: for casting, melting, evaporating, or etching
H01J37/305 (For casting, melting, evaporating, or etching) appears on 1,329 US grants and 1,374 published applications in this corpus.
Search patents in H01J- Granted patents
- 1,329
- Published applications
- 1,374
- Assignees
- 410
- Inventors
- 2,448
- Latest grant
- 29 Sep 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 9 | 0 |
| 1977 | 7 | 0 |
| 1978 | 6 | 0 |
| 1979 | 6 | 0 |
| 1980 | 4 | 0 |
| 1981 | 4 | 0 |
| 1982 | 1 | 0 |
| 1983 | 1 | 0 |
| 1984 | 9 | 0 |
| 1985 | 13 | 0 |
| 1986 | 9 | 0 |
| 1987 | 6 | 0 |
| 1988 | 9 | 0 |
| 1989 | 10 | 0 |
| 1990 | 9 | 0 |
| 1991 | 15 | 0 |
| 1992 | 11 | 0 |
| 1993 | 6 | 0 |
| 1994 | 12 | 0 |
| 1995 | 8 | 0 |
| 1996 | 10 | 0 |
| 1997 | 10 | 0 |
| 1998 | 20 | 0 |
| 1999 | 15 | 0 |
| 2000 | 11 | 0 |
| 2001 | 16 | 10 |
| 2002 | 18 | 21 |
| 2003 | 21 | 24 |
| 2004 | 21 | 41 |
| 2005 | 36 | 41 |
| 2006 | 31 | 59 |
| 2007 | 28 | 57 |
| 2008 | 34 | 65 |
| 2009 | 59 | 53 |
| 2010 | 29 | 54 |
| 2011 | 35 | 44 |
| 2012 | 51 | 49 |
| 2013 | 46 | 57 |
| 2014 | 56 | 53 |
| 2015 | 52 | 64 |
| 2016 | 61 | 69 |
| 2017 | 54 | 42 |
| 2018 | 39 | 55 |
| 2019 | 57 | 64 |
| 2020 | 69 | 66 |
| 2021 | 57 | 71 |
| 2022 | 59 | 75 |
| 2023 | 54 | 67 |
| 2024 | 51 | 49 |
| 2025 | 41 | 68 |
| 2026 | 33 | 56 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
Recent patents
- End point determination by means of contrast gas29 Sep 2026US 12,748,347 B2Carl Zeiss SMT GmbH
- Method and system for analyzing three-dimensional features22 Sep 2026US 12,744,180 B2FEI Company
- Focused ion beam device8 Sep 2026US 12,731,755 B2Hitachi High-Tech Science Corporation
- Ion beam etching machine and lower electrode structure thereof8 Sep 2026US 12,731,758 B2Jiangsu Leuven Instruments Co. Ltd
- Air bearing shaft with wide operating temperature range11 Aug 2026US 12,706,271 B2APPLIED Materials.Inc.
- Charged particle beam device and control method therefor1 Oct 2026US 2026/0302131 A1Hitachi, Ltd.
- Adaptive illumination for a dual beam system10 Sep 2026US 2026/0269178 A1FEI Company
- Ion Milling Device3 Sep 2026US 2026/0260846 A1Hitachi High-Tech Corporation
- Ion Milling Device and Processing Method Using Same27 Aug 2026US 2026/0253837 A1Hitachi High-Tech Corporation
- Method for micromachining a biological sample for creating a lamella for analysis in a cryo-charged particle microscope27 Aug 2026US 2026/0253838 A1FEI Company
Most cited
By later US patents
- Method and apparatus for sample fabrication177US 6,538,254 B1Hitachi, Ltd. · 2003
- Precise metrology with adaptive milling154US 8,222,599 B1Western Digital (Fremont), LLC · 2012
- Closed-loop process control for electron beam freeform fabrication and deposition processes135US 8,452,073 B2The United States of America as represented by the Administrator of the National Aeronautics and Space Administration · 2013
- Method for separating specimen and method for analyzing the specimen separated by the specimen separating method131US 5,270,552 AHitachi, Ltd. · 1993
- Method involving pulsed light processing of semiconductor devices127US 4,151,008 ASpire Corporation · 1979