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AssigneeJiangsu Leuven Instruments Co. Ltd
InventorsHuaidong Zhang, Yaoyao Zhang, Dongdong Hu, Chaoquan Yang, Shiran Cheng, Xiang Yu, Xiaoli Shi, Kaidong Xu
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An ion beam etching machine and a lower electrode structure thereof. The lower electrode structure comprises an electrode plate, a ring pressing mechanism, and a lifting mechanism, the ring pressing mechanism being configured to support a member to be etched, and the lifting mechanism being configured to drive the ring pressing mechanism to ascend and descend relative to the electrode plate; and same further comprises a position measurement mechanism for measuring a position to which the ring pressing mechanism descends relative to the electrode plate. The lifting mechanism is configured to stop driving the ring pressing mechanism to descend based on measurement information fed back by the position measurement mechanism. The arrangement of the lower electrode structure can avoid fragmenting of the member to be etched, and improve the product yield.
A lower electrode structure of an ion beam etching machine, comprising an electrode plate, a pressing ring mechanism and a lifting mechanism, wherein the pressing ring mechanism is configured to support a to-be-etched component, the lifting mechanism is configured for driving the pressing ring mechanism to rise and descend relative to the electrode plate;
An ion beam etching machine, comprising a vacuum chamber and a lower electrode structure disposed in the vacuum chamber;
Dependencies are inferred from the claim text.