H01J 2237/31713
Focused ion beam
H01J2237/31713 (Focused ion beam) appears on 39 US grants and 52 published applications in this corpus.
Search patents in H01J- Granted patents
- 39
- Published applications
- 52
- Assignees
- 24
- Inventors
- 83
- Latest grant
- 22 Jul 2025
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1987 | 1 | 0 |
| 1988 | 0 | 0 |
| 1989 | 0 | 0 |
| 1990 | 0 | 0 |
| 1991 | 0 | 0 |
| 1992 | 0 | 0 |
| 1993 | 0 | 0 |
| 1994 | 0 | 0 |
| 1995 | 0 | 0 |
| 1996 | 1 | 0 |
| 1997 | 0 | 0 |
| 1998 | 0 | 0 |
| 1999 | 0 | 0 |
| 2000 | 0 | 0 |
| 2001 | 0 | 0 |
| 2002 | 0 | 2 |
| 2003 | 1 | 2 |
| 2004 | 0 | 1 |
| 2005 | 1 | 2 |
| 2006 | 1 | 0 |
| 2007 | 2 | 8 |
| 2008 | 0 | 2 |
| 2009 | 6 | 2 |
| 2010 | 3 | 4 |
| 2011 | 0 | 2 |
| 2012 | 2 | 4 |
| 2013 | 2 | 3 |
| 2014 | 4 | 3 |
| 2015 | 3 | 3 |
| 2016 | 0 | 2 |
| 2017 | 3 | 0 |
| 2018 | 1 | 2 |
| 2019 | 1 | 3 |
| 2020 | 1 | 0 |
| 2021 | 2 | 1 |
| 2022 | 0 | 1 |
| 2023 | 2 | 2 |
| 2024 | 1 | 2 |
| 2025 | 1 | 0 |
| 2026 | 0 | 1 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Optimized saddle nozzle design for gas injection system22 Jul 2025US 12,368,019 B2Applied Materials Israel Ltd.
- Semiconductor wafer12 Mar 2024US 11,929,229 B2Mi2-Factory GmbH
- Method and device for implanting ions in wafers18 Jul 2023US 11,705,300 B2Mi2-Factory GmbH
- FIB delayering endpoint detection by monitoring sputtered materials using RGA4 Jul 2023US 11,694,934 B2Applied Materials Israel Ltd.
- Method and device for implanting ions in wafers6 Jul 2021US 11,056,309 B2Mi2-Factory GmbH
- Lamella hole trench fill method14 May 2026US 2026/0135062 A1FEI Company
- Enhanced deposition rate by applying a negative voltage to a gas injection nozzle in fib systems28 Mar 2024US 2024/0105421 A1Applied Materials Israel Ltd.
- Optimized saddle nozzle design for gas injection system21 Mar 2024US 2024/0096592 A1Applied Materials Israel Ltd.
- Semiconductor wafer7 Sep 2023US 2023/0282439 A1Mi2-Factory GmbH
- Fib delayering endpoint detection by monitoring sputtered materials using rga6 Apr 2023US 2023/0104390 A1Applied Materials Israel Ltd.
Most cited
By later US patents
- Graphical automated machine control and metrology52US 6,889,113 B2FEI Company · 2005
- Apparatus and method for controlled particle beam manufacturing33US 7,259,373 B2NexGenSemi Holdings Corporation · 2007
- Hybrid focused-flood ion beam system and method31US 4,687,940 AHughes Aircraft Company · 1987
- Apparatus and method for controlled particle beam manufacturing22US 7,659,526 B2NexGen Semi Holding, Inc. · 2010
- Apparatus and method for controlled particle beam manufacturing18US 7,501,644 B2NexGen Semi Holding, Inc. · 2009