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US 11,929,229 B2Granted
Semiconductor wafer
AssigneeMi2-Factory GmbH
InventorsFlorian Krippendorf, Constantin Csato
Life of this patent
Estimating the term…
Abstract
A semiconductor wafer includes a first surface and an implantation area adjacent to the first surface and a certain distance away from the first surface, the implantation area including implanted particles and defects. A defect concentration in the implantation area deviates by less than 5% from a maximum defect concentration in the implantation area.
Claims13
A semiconductor wafer comprising:
- a first surface;
- and
- an implantation area, which is adjacent to the first surface and a certain distance away from the first surface, and which comprises implanted particles and defects;
- wherein a defect concentration in the implantation area deviates by less than 5% from a maximum defect concentration in the implantation area.
1 more element
Dependencies are inferred from the claim text.