H01J 2237/2025
Sensing velocity of translation or rotation
H01J2237/2025 (Sensing velocity of translation or rotation) appears on 12 US grants and 15 published applications in this corpus.
Search patents in H01J- Granted patents
- 12
- Published applications
- 15
- Assignees
- 12
- Inventors
- 34
- Latest grant
- 16 Sep 2025
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1995 | 1 | 0 |
| 1996 | 0 | 0 |
| 1997 | 0 | 0 |
| 1998 | 0 | 0 |
| 1999 | 0 | 0 |
| 2000 | 0 | 0 |
| 2001 | 0 | 0 |
| 2002 | 0 | 0 |
| 2003 | 0 | 0 |
| 2004 | 0 | 0 |
| 2005 | 0 | 2 |
| 2006 | 1 | 1 |
| 2007 | 1 | 1 |
| 2008 | 1 | 2 |
| 2009 | 0 | 0 |
| 2010 | 1 | 1 |
| 2011 | 0 | 0 |
| 2012 | 1 | 0 |
| 2013 | 1 | 2 |
| 2014 | 0 | 0 |
| 2015 | 1 | 1 |
| 2016 | 0 | 1 |
| 2017 | 0 | 0 |
| 2018 | 1 | 1 |
| 2019 | 0 | 1 |
| 2020 | 2 | 0 |
| 2021 | 0 | 0 |
| 2022 | 0 | 1 |
| 2023 | 0 | 0 |
| 2024 | 0 | 0 |
| 2025 | 1 | 0 |
| 2026 | 0 | 1 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Diffractometer for charged-particle crystallography16 Sep 2025US 12,417,893 B2Eldico Scientific AG
- Charged particle beam device and control method of charged particle beam device28 Apr 2020US 10,636,620 B2Hitachi High-Technologies Corporation
- Sample manipulation for nondestructive sample imaging14 Jan 2020US 10,535,495 B2BAE Systems Information and Electronic Systems Integration Inc.
- Exposure apparatus and exposure method2 Jan 2018US 9,859,099 B2Advantest Corporation
- Roller mold manufacturing device and manufacturing method7 Apr 2015US 9,000,325 B2Asahi Kasei Kabushiki Kaisha
- Charged-particle irradiation unit for a charged-particle diffractometer29 Jan 2026US 2026/0031299 A1
- Diffractometer for charged-particle crystallography28 Jul 2022US 2022/0238299 A1Eldico Scientific AG
- Sample manipulation for nondestructive sample imaging10 Oct 2019US 2019/0311877 A1BAE Systems Information and Electronic Systems Integration Inc.
- Charged particle beam device and control method of charged particle beam device31 May 2018US 2018/0151328 A1Hitachi High-Technologies Corporation
- Exposure apparatus and exposure method27 Oct 2016US 2016/0314934 A1Advantest Corporation
Most cited
By later US patents
- Charged particle beam deflection method with separate stage tracking and stage positional error signals49US 8,384,048 B2Multibeam Corporation · 2013
- Ion beam scan control25US 5,432,352 AEaton Corporation · 1995
- Electron beam exposure apparatus involving the position and velocity calculation8US 7,777,202 B2Advantest Corporation · 2010
- Move mechanism for moving target object and charged particle beam writing apparatus8US 8,277,603 B2NuFlare Technology, Inc. · 2012
- Method and apparatus for electron beam processing of substrates6US 7,038,225 B2Seagate Technology LLC · 2006