Exposure apparatus and exposure method
AssigneeAdvantest Corporation
InventorsAkio Yamada, Masahiro Seyama, Hideki Nasuno
Life of this patent
Estimating the term…
Abstract
Complex and fine patterns may be formed by an exposure apparatus that decreases movement error of a stage including a beam generating section that generates a charged particle beam, a stage section that has a sample mounted thereon and moves the sample relative to the beam generating section, a detecting section that detects a position of the stage section, a predicting section that generates a predicted drive amount obtained by predicting a drive amount of the stage section based on a detected position of the stage section, and an irradiation control section that performs irradiation control for irradiating the sample with the charged particle beam, based on the predicted drive amount.
Claims10
An exposure apparatus comprising:
- a beam generator that generates a plurality of charged particle beams having different irradiation positions in a width direction of a line pattern on a sample;
- a blanking electrode to selectively irradiate the sample at designated irradiation positions in a longitudinal direction on the line pattern;
- a stage adapted to have a sample mounted thereon and move the sample relative to the plurality of charged particle beams;
- a detector that detects a position of the stage;
- and
- a plurality of deflectors to separately deflect the plurality of charged particle beams.
An exposure method for irradiating a sample with a charged particle beam, comprising:
- generating, with a beam generating section, the charged particle beam;
- moving, with a stage section that has a sample mounted thereon, the sample relative to the beam generating section;
- detecting a position of the stage section;
- generating a predicted drive amount obtained by predicting a drive amount of the stage section based on a detected position of the stage section;
- performing irradiation control for irradiating the sample with the charged particle beam, based on the predicted drive amount, including controlling a time during which the sample is irradiated with the charged particle beam, such that an exposure amount distribution draws near a predetermined target for the exposure amount distribution, and
- deflecting the charged particle beam based on a difference between the detected position of the stage section and a predicted position of the stage section corresponding to the predicted drive amount.
An exposure method for irradiating a sample with a charged particle beam, comprising:
- generating, with a beam generating section, the charged particle beam;
- moving, with a stage section that has a sample mounted thereon, the sample relative to the beam generating section;
- detecting a position of the stage section;
- generating a predicted drive amount obtained by predicting a drive amount of the stage section based on a detected position of the stage section;
- and
- performing irradiation control for irradiating the sample with the charged particle beam, based on the predicted drive amount, wherein
- the performing irradiation control includes controlling an irradiation amount of the charged particle beam based on a difference between a movement velocity of the stage section and a predicted movement velocity of the stage section.
Dependencies are inferred from the claim text.