Exposure apparatus and exposure method

An exposure method for irradiating a sample with a charged particle beam, comprising:

• generating, with a beam generating section, the charged particle beam;
• moving, with a stage section that has a sample mounted thereon, the sample relative to the beam generating section;
• detecting a position of the stage section;
• generating a predicted drive amount obtained by predicting a drive amount of the stage section based on a detected position of the stage section;
• performing irradiation control for irradiating the sample with the charged particle beam, based on the predicted drive amount;
• and
• deflecting the charged particle beam based on a difference between the detected position of the stage section and a predicted position of the stage section corresponding to the predicted drive amount.

An exposure method for irradiating a sample with a charged particle beam, comprising:

• generating, with a beam generating section, the charged particle beam;
• moving, with a stage section that has a sample mounted thereon, the sample relative to the beam generating section;
• detecting a position of the stage section;
• generating a predicted drive amount obtained by predicting a drive amount of the stage section based on a detected position of the stage section;
• and
• performing irradiation control for irradiating the sample with the charged particle beam, based on the predicted drive amount, wherein
• the performing irradiation control includes controlling an irradiation amount of the charged particle beam based on a difference between a movement velocity of the stage section and a predicted movement velocity of the stage section.