H01J 2237/186
Valves
H01J2237/186 (Valves) appears on 60 US grants and 80 published applications in this corpus.
Search patents in H01J- Granted patents
- 60
- Published applications
- 80
- Assignees
- 43
- Inventors
- 240
- Latest grant
- 15 Sep 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1992 | 2 | 0 |
| 1993 | 0 | 0 |
| 1994 | 0 | 0 |
| 1995 | 0 | 0 |
| 1996 | 0 | 0 |
| 1997 | 2 | 0 |
| 1998 | 1 | 0 |
| 1999 | 2 | 0 |
| 2000 | 1 | 0 |
| 2001 | 2 | 0 |
| 2002 | 0 | 0 |
| 2003 | 2 | 0 |
| 2004 | 1 | 1 |
| 2005 | 0 | 0 |
| 2006 | 1 | 1 |
| 2007 | 0 | 0 |
| 2008 | 0 | 1 |
| 2009 | 0 | 1 |
| 2010 | 1 | 1 |
| 2011 | 0 | 1 |
| 2012 | 2 | 3 |
| 2013 | 2 | 2 |
| 2014 | 2 | 1 |
| 2015 | 0 | 1 |
| 2016 | 2 | 1 |
| 2017 | 2 | 3 |
| 2018 | 1 | 3 |
| 2019 | 2 | 5 |
| 2020 | 3 | 8 |
| 2021 | 3 | 5 |
| 2022 | 4 | 8 |
| 2023 | 3 | 16 |
| 2024 | 9 | 5 |
| 2025 | 6 | 10 |
| 2026 | 4 | 3 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Vacuum processing device15 Sep 2026US 12,738,447 B2Hitachi High-Tech Corporation
- Condensate precursors and contaminant purge apparatus and methods28 Jul 2026US 12,695,052 B2FEI Company
- Electron gun chamber for scanning electron microscope, electron gun containing same, and scanning electron microscope19 May 2026US 12,633,493 B2National Institute for Materials Science
- Center feed symmetric flow valve for plasma chambers24 Feb 2026US 12,560,243 B2APPLIED Materials.Inc.
- Tin oxide films in semiconductor device manufacturing7 Oct 2025US 12,437,995 B2Lam Research Corporation
- Substrate processing apparatus and substrate processing method30 Jul 2026US 2026/0221391 A1Tokyo Electron Limited
- Substrate processing apparatus and control method of substrate processing apparatus29 Jan 2026US 2026/0033294 A1Samsung Electronics Co., Ltd.
- Multi-beam particle microscope with a quickly replaceable particle source, and method for quickly replacing a particle source in the multi-beam particle microscope8 Jan 2026US 2026/0011524 A1
- System and Method for Rapidly Establishing Steady State Vacuum Chamber Pressures11 Dec 2025US 2025/0379041 A1Inspiring Atoms Pte Ltd
- Broad ion beam (bib) systems for more efficient processing of multiple samples16 Oct 2025US 2025/0321164 A1FEI Company
Most cited
By later US patents
- Electron beam lithography apparatus with self actuated vacuum bypass valve74US 6,724,001 B1International Business Machines Corporation · 2004
- Double slit-valve doors for plasma processing56US 6,192,827 B1APPLIED Materials.Inc. · 2001
- Inspection device27US 8,497,476 B2Ebara Corporation · 2013
- Tin oxide films in semiconductor device manufacturing24US 10,546,748 B2Lam Research Corporation · 2020
- Thin film forming equipment18US 5,683,072 A1997