Condensate precursors and contaminant purge apparatus and methods
AssigneeFEI Company
InventorsJing Wang, Chad Rue, Aurelien Philippe Jean Maclou Botman
Life of this patent
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AssigneeFEI Company
InventorsJing Wang, Chad Rue, Aurelien Philippe Jean Maclou Botman
Estimating the term…
Methods include arranging a substrate in a vacuum chamber of a charged particle beam microscope, wherein the substrate is held at a cryogenic temperature, and depositing on the substrate at the cryogenic temperature a condensate precursor that is stored in a crucible, wherein the deposited condensate precursor forms a deposition layer on the substrate. An apparatus include a vacuum chamber configured to support a substrate, a condensate precursor system coupled to the vacuum chamber, wherein a vacuum pump is configured to draw a vacuum on a storage reservoir to reduce a vapor pressure build-up of a one or more volatile contaminants in the storage reservoir and thereby reduce a deposition of the one or more contaminants on the substrate during the condensing of the condensate precursor on the substrate. A condensate precursor can comprise a transition metal center comprising hafnium or osmium. Related deposition and cap layers are disclosed.
A method, comprising:
An apparatus, comprising:
An electrically conductive sample cap layer, comprising:
Dependencies are inferred from the claim text.