Thin film forming equipment
AssigneeTadahiro Ohmi
InventorsTadahiro Ohmi, Tadashi Shibata, Masaru Umeda
Life of this patent
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Abstract
A gate valve for a thin film forming apparatus. The gate valve includes two adjoining low-pressure chambers and a wall separating the two chambers. The wall includes an aperture and a thin plate for covering the aperture. The thin plate is movable in a direction substantially parallel to the plate surface. The gate valve further includes a voltage supply for applying a direct current between the thin plate and the wall.
Claims2
A gate valve for a thin film forming apparatus, said apparatus including two adjoining low pressure chambers and a wall separating said chambers, said wall including an aperture, said gate valve comprising:
- a thin plate, said thin plate having a plate surface;
- drive means operatively associated with said plate for moving said plate in a direction substantially parallel to said plate surface whereby said thin plate can selectively cover and uncover said aperture;
- and
- means for applying a direct current voltage between said thin plate and said wall.
Dependencies are inferred from the claim text.