H01J 2237/081
Sputtering sources
H01J2237/081 (Sputtering sources) appears on 49 US grants and 54 published applications in this corpus.
Search patents in H01J- Granted patents
- 49
- Published applications
- 54
- Assignees
- 41
- Inventors
- 133
- Latest grant
- 25 Aug 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1991 | 1 | 0 |
| 1992 | 1 | 0 |
| 1993 | 0 | 0 |
| 1994 | 1 | 0 |
| 1995 | 1 | 0 |
| 1996 | 0 | 0 |
| 1997 | 0 | 0 |
| 1998 | 1 | 0 |
| 1999 | 0 | 0 |
| 2000 | 1 | 0 |
| 2001 | 0 | 0 |
| 2002 | 1 | 0 |
| 2003 | 0 | 0 |
| 2004 | 0 | 0 |
| 2005 | 0 | 0 |
| 2006 | 0 | 0 |
| 2007 | 0 | 0 |
| 2008 | 0 | 1 |
| 2009 | 1 | 0 |
| 2010 | 0 | 0 |
| 2011 | 0 | 2 |
| 2012 | 1 | 2 |
| 2013 | 0 | 7 |
| 2014 | 2 | 2 |
| 2015 | 3 | 1 |
| 2016 | 7 | 12 |
| 2017 | 1 | 4 |
| 2018 | 2 | 1 |
| 2019 | 7 | 2 |
| 2020 | 1 | 5 |
| 2021 | 6 | 1 |
| 2022 | 1 | 2 |
| 2023 | 3 | 2 |
| 2024 | 1 | 4 |
| 2025 | 3 | 4 |
| 2026 | 3 | 2 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Ion source containing a sputter target25 Aug 2026US 12,719,007 B2APPLIED Materials.Inc.
- Systems and methods for aluminum ion beam generation source technology24 Mar 2026US 12,586,756 B2II-Vi Delaware, Inc.
- Sputter deposition source, magnetron sputter cathode, and method of depositing a material on a substrate17 Feb 2026US 12,553,124 B2APPLIED Materials.Inc.
- Crenellated sample holder and sputter target for sample preparation in cryo electron microscopy applications2 Dec 2025US 12,488,957 B2FEI Company
- Support body, manufacturing apparatus for support body, and manufacturing method for support body22 Jul 2025US 12,368,034 B2Ayabo Corporation
- Sputter deposition source, magnetron sputter cathode, and method of depositing a material on a substrate28 May 2026US 2026/0146315 A1APPLIED Materials.Inc.
- Beam Plasma Source8 Jan 2026US 2026/0011530 A1Board of Trustees of Michigan State University
- Granular sputter source target with repeller cup and method for use thereof11 Dec 2025US 2025/0379023 A1Axcelis Technologies, Inc.
- Multifaceted target for an ion source12 Jun 2025US 2025/0191901 A1Axcelis Technologies, Inc.
- Actively heated target to generate an ion beam10 Apr 2025US 2025/0118524 A1Axcelis Technologies, Inc.
Most cited
By later US patents
- Ion generation apparatus and thin film forming apparatus and ion source utilizing the ion generation apparatus27US 5,022,977 ANippon Telegraph and Telephone Corporation · 1991
- Method and apparatus for generating ions21US 5,780,862 A1998
- Device for the ionization of metals having a high melting point, which may be used on ion implanters of the type using ion sources of Freeman or similar type15US 5,144,143 AConsorzio per la Ricerca sulla Microelettronica nel Mezzogiorno · 1992
- Ion source crucible for solid feed materials11US 10,600,611 B2APPLIED Materials.Inc. · 2020
- Metal ion source and a method of producing metal ions11US 5,315,121 AFraunhofer-Gesellschaft zur Förderung der angewandten Forschung e. V. · 1994