G03F 7/2016
Contact mask being integral part of the photosensitive element and subject to
Official title: {Contact mask being integral part of the photosensitive element and subject to destructive removal during post-exposure processing}
G03F7/2016 (Contact mask being integral part of the photosensitive element and subject to) appears on 391 US grants and 420 published applications in this corpus.
Search patents in G03F- Granted patents
- 391
- Published applications
- 420
- Assignees
- 186
- Inventors
- 864
- Latest grant
- 6 Oct 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 1 | 0 |
| 1977 | 1 | 0 |
| 1978 | 0 | 0 |
| 1979 | 2 | 0 |
| 1980 | 1 | 0 |
| 1981 | 3 | 0 |
| 1982 | 0 | 0 |
| 1983 | 0 | 0 |
| 1984 | 2 | 0 |
| 1985 | 3 | 0 |
| 1986 | 1 | 0 |
| 1987 | 2 | 0 |
| 1988 | 0 | 0 |
| 1989 | 4 | 0 |
| 1990 | 2 | 0 |
| 1991 | 1 | 0 |
| 1992 | 0 | 0 |
| 1993 | 5 | 0 |
| 1994 | 4 | 0 |
| 1995 | 3 | 0 |
| 1996 | 4 | 0 |
| 1997 | 3 | 0 |
| 1998 | 11 | 0 |
| 1999 | 11 | 0 |
| 2000 | 8 | 0 |
| 2001 | 14 | 6 |
| 2002 | 14 | 14 |
| 2003 | 11 | 10 |
| 2004 | 8 | 13 |
| 2005 | 10 | 9 |
| 2006 | 9 | 13 |
| 2007 | 4 | 8 |
| 2008 | 4 | 5 |
| 2009 | 3 | 16 |
| 2010 | 5 | 11 |
| 2011 | 5 | 14 |
| 2012 | 14 | 24 |
| 2013 | 15 | 18 |
| 2014 | 22 | 20 |
| 2015 | 20 | 20 |
| 2016 | 15 | 16 |
| 2017 | 13 | 11 |
| 2018 | 12 | 20 |
| 2019 | 15 | 18 |
| 2020 | 17 | 18 |
| 2021 | 10 | 18 |
| 2022 | 13 | 31 |
| 2023 | 17 | 30 |
| 2024 | 21 | 23 |
| 2025 | 14 | 25 |
| 2026 | 14 | 9 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
Recent patents
- Apparatus for treating substrate and method for treating a substrate6 Oct 2026US 12,754,475 B2Semes Co., Ltd.
- Hardmask composition, hardmask layer, and pattern forming method6 Oct 2026US 12,754,481 B2Samsung SDI.Co., Ltd.
- Hybrid method of forming microstructure array molds, methods of making microstructure arrays, and methods of use15 Sep 2026US 12,734,730 B2Panther Life Sciences Corporation
- Curable water-based composition, active-energy-ray-curable water-based composition, active-energy-ray-curable water-based ink, stored container, two-dimensional or three-dimensional image forming apparatus, two-dimensional or three-dimensional image forming method, cured product, and decorated body21 Jul 2026US 12,687,780 B2Ricoh Company, Ltd.
- Composition for forming silicon-containing metal hard mask and patterning process30 Jun 2026US 12,668,700 B2Shin-Etsu Chemical Co., Ltd.
- High chi block copolymer (bcp) pattern on latent extreme ultraviolet (euv) images8 Oct 2026US 2026/0310085 A1APPLIED Materials.Inc.
- Method for smoother tonal response in flexographic printing17 Sep 2026US 2026/0273977 A1Esko Software BV
- Process and system for minimizing plate deformation in the solvent-minimized manufacture of a printing plate13 Aug 2026US 2026/0233508 A1Esko-Graphics Imaging GmbH
- Method, control module and system for imaging a mask layer2 Jul 2026US 2026/0184096 A1Xsys Prepress NV
- Flexographic printing plate precursor and manufacturing method of flexographic printing plate18 Jun 2026US 2026/0169381 A1FUJIFILM Corporation
Most cited
By later US patents
- Semiconductor substrate process using an optically writable carbon-containing mask539US 7,429,532 B2APPLIED Materials.Inc. · 2008
- Flexographic printing element having an IR ablatable layer and process for making a flexographic printing plate200US 5,262,275 AE. I. Du Pont de Nemours and Company · 1993
- Three dimensional micro machining with a modulated ultra-short laser pulse140US 6,285,002 B12001
- Flexographic element having an infrared ablatable layer132US 6,238,837 B1E. I. Du Pont de Nemours and Company · 2001
- Coated transparent film for laser imaging107US 4,245,003 AJames River Graphics, Inc. · 1981