G03F 7/063
Additives or means to improve the lithographic properties
Official title: {Additives or means to improve the lithographic properties; Processing solutions characterised by such additives; Treatment after development or transfer, e.g. finishing, washing; Correction or deletion fluids}
G03F7/063 (Additives or means to improve the lithographic properties) appears on 78 US grants and 30 published applications in this corpus.
Search patents in G03F- Granted patents
- 78
- Published applications
- 30
- Assignees
- 22
- Inventors
- 124
- Latest grant
- 30 Jun 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 2 | 0 |
| 1977 | 1 | 0 |
| 1978 | 0 | 0 |
| 1979 | 0 | 0 |
| 1980 | 4 | 0 |
| 1981 | 2 | 0 |
| 1982 | 2 | 0 |
| 1983 | 0 | 0 |
| 1984 | 2 | 0 |
| 1985 | 0 | 0 |
| 1986 | 2 | 0 |
| 1987 | 0 | 0 |
| 1988 | 1 | 0 |
| 1989 | 2 | 0 |
| 1990 | 1 | 0 |
| 1991 | 2 | 0 |
| 1992 | 1 | 0 |
| 1993 | 2 | 0 |
| 1994 | 4 | 0 |
| 1995 | 5 | 0 |
| 1996 | 5 | 0 |
| 1997 | 2 | 0 |
| 1998 | 3 | 0 |
| 1999 | 4 | 0 |
| 2000 | 5 | 0 |
| 2001 | 3 | 0 |
| 2002 | 1 | 2 |
| 2003 | 1 | 2 |
| 2004 | 1 | 0 |
| 2005 | 1 | 1 |
| 2006 | 0 | 0 |
| 2007 | 0 | 2 |
| 2008 | 1 | 0 |
| 2009 | 1 | 0 |
| 2010 | 1 | 1 |
| 2011 | 0 | 1 |
| 2012 | 0 | 0 |
| 2013 | 1 | 0 |
| 2014 | 0 | 0 |
| 2015 | 0 | 0 |
| 2016 | 1 | 1 |
| 2017 | 1 | 1 |
| 2018 | 0 | 4 |
| 2019 | 5 | 4 |
| 2020 | 0 | 4 |
| 2021 | 0 | 0 |
| 2022 | 4 | 2 |
| 2023 | 1 | 3 |
| 2024 | 1 | 0 |
| 2025 | 1 | 2 |
| 2026 | 1 | 0 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
Recent patents
- Composition for forming silicon-containing metal hard mask and patterning process30 Jun 2026US 12,668,700 B2Shin-Etsu Chemical Co., Ltd.
- Resist material and patterning process2 Dec 2025US 12,487,524 B2Shin-Etsu Chemical Co., Ltd.
- Method of forming patterns using resist underlayer composition14 May 2024US 11,982,943 B2Samsung SDI.Co., Ltd.
- Chemically amplified positive-type photosensitive resin composition, photosensitive dry film, method of manufacturing photosensitive dry film, method of manufacturing patterned resist film, method of manufacturing substrate with template, method of manufacturing plated article, and nitrogen-containing aromatic heterocyclic compound10 Jan 2023US 11,550,221 B2Tokyo Ohka Kog Yo Co., Ltd.
- Resist composition and patterning process19 Jul 2022US 11,392,034 B2Shin-Etsu Chemical Co., Ltd.
- Method for producing active ray-sensitive or radiation-sensitive resin composition, method for producing onium salt compound for active ray-sensitive or radiation-sensitive resin composition, pattern forming method, method for producing electronic device, and onium salt composition22 May 2025US 2025/0164884 A1FUJIFILM Corporation
- Resist composition and pattern forming process1 May 2025US 2025/0138423 A1Shin-Etsu Chemical Co., Ltd.
- Composition for forming silicon-containing metal hard mask and patterning process28 Sep 2023US 2023/0305405 A1Shin-Etsu Chemical Co., Ltd.
- Photoacid generator and photoresist composition including the same27 Apr 2023US 2023/0130998 A1Samsung Electronics Co., Ltd.
- Resist material and patterning process26 Jan 2023US 2023/0022129 A1Shin-Etsu Chemical Co., Ltd.
Most cited
By later US patents
- Method for making a lithographic printing plate50US 5,763,137 AAgfa-Gevaert · 1998
- Lithographic printing plates24US 4,567,131 AVickers, Incorporated · 1986
- Method for making a lithographic printing plate according to the silver salt diffusion transfer process19US 5,200,294 AAgfa-Gevaert · 1993
- Processing composition for printing plate16US 5,118,583 AMitsubishi Paper Mills Limited · 1992
- Fixer compositions used in planographic printing containing onium compounds13US 4,062,682 AAgfa-Gevaert · 1977