G03F 7/066
Organic derivatives of bivalent sulfur
Official title: {Organic derivatives of bivalent sulfur, e.g. onium derivatives}
G03F7/066 (Organic derivatives of bivalent sulfur) appears on 26 US grants and 11 published applications in this corpus.
Search patents in G03F- Granted patents
- 26
- Published applications
- 11
- Assignees
- 9
- Inventors
- 60
- Latest grant
- 2 Dec 2025
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1980 | 1 | 0 |
| 1981 | 1 | 0 |
| 1982 | 1 | 0 |
| 1983 | 0 | 0 |
| 1984 | 2 | 0 |
| 1985 | 0 | 0 |
| 1986 | 0 | 0 |
| 1987 | 0 | 0 |
| 1988 | 0 | 0 |
| 1989 | 0 | 0 |
| 1990 | 0 | 0 |
| 1991 | 0 | 0 |
| 1992 | 1 | 0 |
| 1993 | 2 | 0 |
| 1994 | 2 | 0 |
| 1995 | 2 | 0 |
| 1996 | 1 | 0 |
| 1997 | 2 | 0 |
| 1998 | 2 | 0 |
| 1999 | 1 | 0 |
| 2000 | 0 | 0 |
| 2001 | 1 | 0 |
| 2002 | 0 | 0 |
| 2003 | 1 | 1 |
| 2004 | 0 | 0 |
| 2005 | 0 | 0 |
| 2006 | 0 | 0 |
| 2007 | 0 | 0 |
| 2008 | 0 | 0 |
| 2009 | 0 | 0 |
| 2010 | 0 | 0 |
| 2011 | 0 | 1 |
| 2012 | 0 | 0 |
| 2013 | 1 | 0 |
| 2014 | 0 | 0 |
| 2015 | 0 | 0 |
| 2016 | 0 | 0 |
| 2017 | 0 | 0 |
| 2018 | 0 | 0 |
| 2019 | 0 | 1 |
| 2020 | 0 | 2 |
| 2021 | 0 | 0 |
| 2022 | 3 | 2 |
| 2023 | 0 | 2 |
| 2024 | 1 | 0 |
| 2025 | 1 | 2 |
By publication year. Applications have been published since 2001.
Recent patents
- Resist material and patterning process2 Dec 2025US 12,487,524 B2Shin-Etsu Chemical Co., Ltd.
- Method of forming patterns using resist underlayer composition14 May 2024US 11,982,943 B2Samsung SDI.Co., Ltd.
- Resist composition and patterning process19 Jul 2022US 11,392,034 B2Shin-Etsu Chemical Co., Ltd.
- Resist underlayer composition, and method of forming patterns using the composition12 Jul 2022US 11,385,545 B2Samsung SDI.Co., Ltd.
- Sulfonium compound, resist composition, and patterning process4 Jan 2022US 11,215,926 B2Shin-Etsu Chemical Co., Ltd.
- Method for producing active ray-sensitive or radiation-sensitive resin composition, method for producing onium salt compound for active ray-sensitive or radiation-sensitive resin composition, pattern forming method, method for producing electronic device, and onium salt composition22 May 2025US 2025/0164884 A1FUJIFILM Corporation
- Resist composition and pattern forming process1 May 2025US 2025/0138423 A1Shin-Etsu Chemical Co., Ltd.
- Photoacid generator and photoresist composition including the same27 Apr 2023US 2023/0130998 A1Samsung Electronics Co., Ltd.
- Resist material and patterning process26 Jan 2023US 2023/0022129 A1Shin-Etsu Chemical Co., Ltd.
- Method of forming patterns using resist underlayer composition18 Aug 2022US 2022/0260914 A1Samsung SDI.Co., Ltd.
Most cited
By later US patents
- Method for making a lithographic printing plate according to the silver salt diffusion transfer process19US 5,200,294 AAgfa-Gevaert · 1993
- Processing composition for printing plate16US 5,118,583 AMitsubishi Paper Mills Limited · 1992
- Lithographic printing plate from silver halide emulsion12US 4,230,792 AMitsubishi Paper Mills Limited · 1980
- Photographic material and diffusion transfer processing solution for making printing plates and method for making printing plates12US 4,297,429 AMitsubishi Paper Mills Limited · 1981
- Method for treating lithographic printing plates8US 4,361,639 AMitsubishi Paper Mills Limited · 1982