G03F 7/0381
Using a combination of a phenolic resin and a polyoxyethylene resin
Official title: {using a combination of a phenolic resin and a polyoxyethylene resin}
G03F7/0381 (Using a combination of a phenolic resin and a polyoxyethylene resin) appears on 13 US grants and 19 published applications in this corpus.
Search patents in G03F- Granted patents
- 13
- Published applications
- 19
- Assignees
- 15
- Inventors
- 54
- Latest grant
- 29 Jul 2025
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1981 | 1 | 0 |
| 1982 | 0 | 0 |
| 1983 | 0 | 0 |
| 1984 | 0 | 0 |
| 1985 | 0 | 0 |
| 1986 | 0 | 0 |
| 1987 | 0 | 0 |
| 1988 | 0 | 0 |
| 1989 | 0 | 0 |
| 1990 | 0 | 0 |
| 1991 | 0 | 0 |
| 1992 | 0 | 0 |
| 1993 | 0 | 0 |
| 1994 | 1 | 0 |
| 1995 | 0 | 0 |
| 1996 | 1 | 0 |
| 1997 | 0 | 0 |
| 1998 | 0 | 0 |
| 1999 | 0 | 0 |
| 2000 | 0 | 0 |
| 2001 | 0 | 0 |
| 2002 | 0 | 0 |
| 2003 | 0 | 0 |
| 2004 | 0 | 0 |
| 2005 | 0 | 0 |
| 2006 | 0 | 1 |
| 2007 | 0 | 0 |
| 2008 | 0 | 0 |
| 2009 | 0 | 1 |
| 2010 | 0 | 0 |
| 2011 | 1 | 0 |
| 2012 | 0 | 0 |
| 2013 | 0 | 0 |
| 2014 | 0 | 1 |
| 2015 | 0 | 0 |
| 2016 | 0 | 0 |
| 2017 | 1 | 0 |
| 2018 | 0 | 3 |
| 2019 | 0 | 7 |
| 2020 | 3 | 0 |
| 2021 | 4 | 1 |
| 2022 | 0 | 0 |
| 2023 | 0 | 4 |
| 2024 | 0 | 0 |
| 2025 | 1 | 1 |
By publication year. Applications have been published since 2001.
Recent patents
- Apparatuses and methods for diffraction base overlay measurements29 Jul 2025US 12,372,879 B2Micron Technology, Inc.
- Resist underlayer film-forming composition containing naphthol aralkyl resin14 Dec 2021US 11,199,775 B2Nissan Chemical Corporation
- Compound, resin and photoresist composition14 Sep 2021US 11,119,408 B2Sumitomo Chemical Company, Limited
- Organic EL display device18 May 2021US 11,011,707 B2Toray Industries, Inc.
- Negative-type photosensitive resin composition, cured film, display device provided with cured film, and production method therefor20 Apr 2021US 10,983,436 B2Toray Industries, Inc.
- Resist composition and pattern forming process27 Mar 2025US 2025/0102912 A1Shin-Etsu Chemical Co., Ltd.
- Apparatuses and methods for diffraction base overlay measurements22 Jun 2023US 2023/0194996 A1Micron Technology, Inc.
- Negative resist film laminate and pattern formation method8 Jun 2023US 2023/0176479 A1Shin-Etsu Chemical Co., Ltd.
- Resist underlayer film-forming composition25 May 2023US 2023/0161246 A1Nissan Chemical Corporation
- Photosensitive resin composition and cured film prepared therefrom13 Apr 2023US 2023/0109843 A1
Most cited
By later US patents
- Process for forming photo-polymeric image28US 4,251,619 AKonishiroku Photo Industry Co., Ltd. · 1981
- One-component reactive resin system comprising a cure-inhibiting glycidyl phosphorus compound8US 5,576,357 ASiemens Aktiengesellschaft · 1996
- Resist composition and method of forming resist pattern1US 10,606,174 B2Tokyo Ohka Kogyo.Co., Ltd. · 2020
- Negative-type photosensitive resin composition, cured film, element and display apparatus that include cured film, production method for the same1US 10,802,401 B2Toray Industries, Inc. · 2020
- Negative-type photosensitive resin composition, cured film, display device provided with cured film, and production method therefor1US 10,983,436 B2Toray Industries, Inc. · 2021