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US 2025/0102912 A1Published application
Resist composition and pattern forming process
AssigneeShin-Etsu Chemical Co., Ltd.
InventorsJun Hatakeyama, Takayuki Fujiwara
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Abstract
The resist composition comprises an onium salt of sulfonic acid which has a linkage of two iodized or brominated aromatic groups as the acid generator. The resist composition offers a high sensitivity, reduced LWR and improved CDU independent of whether it is of positive or negative tone. A pattern can be formed by using the resist composition.
Claims12
A resist composition comprising an acid generator containing an onium salt of sulfonic acid having a linkage of two iodized or brominated aromatic groups.
Dependencies are inferred from the claim text.