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US 2023/0176479 A1Published application
Negative resist film laminate and pattern formation method
AssigneeShin-Etsu Chemical Co., Ltd.
InventorsYoshinori Hirano, Satoshi Asai
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Abstract
Provided is a negative resist film laminate comprising a thermoplastic film, which is a first support body, and a negative resist film, wherein the negative resist film contains (A) an alkali-soluble resin having a phenolic hydroxy group, (B) a plasticizer containing polyester, (C) a photoacid generator, (D) an epoxy compound containing on average four or more epoxy groups per molecule, and (E) a benzotriazole compound and/or an imidazole compound.
Claims5
A negative resist film laminate comprising a thermoplastic film as a first support and a negative resist film, the negative resist film comprising
- (A) an alkali-soluble resin having a phenolic hydroxy group,
- (B) a plasticizer containing a polyester,
- (C) a photoacid generator,
- (D) an epoxy compound containing on average at least 4 epoxy groups per molecule, and
- (E) a benzotriazole compound and/or imidazole compound.
2 more elements
Dependencies are inferred from the claim text.