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US 2023/0161246 A1Published application
Resist underlayer film-forming composition
AssigneeNissan Chemical Corporation
InventorsHikaru TOKUNAGA, Yutaro KURAMOTO, Makoto NAKAJIMA, Satoshi HAMADA, Katsuya MIURA
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Abstract
Provided is a novel composition for forming a resist underlayer film. This composition for forming a resist underlayer film includes a polymer (X) and a solvent, the polymer (X) containing: a plurality of structural units which are the same as or different from each other and have a methoxymethyl group and a ROCH2- group (R is a monovalent organic group, a hydrogen atom, or a mixture thereof) other than the methoxymethyl group; and a linking group that links the more than one structural unit.
Claims13
A resist underlayer film-forming composition comprising:
- a solvent and a polymer (X) containing the same or different more than one structural unit and a linking group that links the more than one structural unit, each of the more than one structural unit having a methoxymethyl group and an ROCH2— group other than the methoxymethyl group, in which R is a monovalent organic group, a hydrogen atom, or a mixture thereof.
Dependencies are inferred from the claim text.