G03F 1/50
Mask blanks not covered by g03f1/20 - g03f1/34
Official title: Mask blanks not covered by G03F1/20 - G03F1/34; Preparation thereof
G03F1/50 (Mask blanks not covered by g03f1/20 - g03f1/34) appears on 1,053 US grants and 1,020 published applications in this corpus.
Search patents in G03F- Granted patents
- 1,053
- Published applications
- 1,020
- Assignees
- 419
- Inventors
- 2,104
- Latest grant
- 12 May 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 5 | 0 |
| 1977 | 0 | 0 |
| 1978 | 4 | 0 |
| 1979 | 3 | 0 |
| 1980 | 3 | 0 |
| 1981 | 10 | 0 |
| 1982 | 3 | 0 |
| 1983 | 11 | 0 |
| 1984 | 5 | 0 |
| 1985 | 3 | 0 |
| 1986 | 3 | 0 |
| 1987 | 2 | 0 |
| 1988 | 12 | 0 |
| 1989 | 4 | 0 |
| 1990 | 2 | 0 |
| 1991 | 2 | 0 |
| 1992 | 5 | 0 |
| 1993 | 6 | 0 |
| 1994 | 6 | 0 |
| 1995 | 13 | 0 |
| 1996 | 13 | 0 |
| 1997 | 9 | 0 |
| 1998 | 30 | 0 |
| 1999 | 19 | 0 |
| 2000 | 22 | 0 |
| 2001 | 14 | 12 |
| 2002 | 16 | 27 |
| 2003 | 35 | 52 |
| 2004 | 38 | 49 |
| 2005 | 26 | 61 |
| 2006 | 34 | 54 |
| 2007 | 18 | 41 |
| 2008 | 21 | 50 |
| 2009 | 32 | 52 |
| 2010 | 58 | 47 |
| 2011 | 54 | 49 |
| 2012 | 46 | 55 |
| 2013 | 55 | 66 |
| 2014 | 54 | 51 |
| 2015 | 58 | 50 |
| 2016 | 51 | 61 |
| 2017 | 50 | 39 |
| 2018 | 38 | 34 |
| 2019 | 33 | 39 |
| 2020 | 37 | 30 |
| 2021 | 30 | 23 |
| 2022 | 17 | 22 |
| 2023 | 17 | 18 |
| 2024 | 9 | 9 |
| 2025 | 11 | 13 |
| 2026 | 6 | 16 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Method of annealing reflective photomask by using laser12 May 2026US 12,625,424 B2Samsung Electronics Co., Ltd.
- Method for producing flexible printed wiring board24 Feb 2026US 12,563,669 B2Fujikura Printed Circuits Ltd.
- Method for fabricating a semiconductor device with a composite barrier structure17 Feb 2026US 12,557,622 B2Nanya Technology Corporation
- Method and apparatus for setting a side wall angle of a pattern element of a photolithographic mask27 Jan 2026US 12,535,726 B2Carl Zeiss SMT GmbH
- Photomask blank, manufacturing method of photomask and photomask27 Jan 2026US 12,535,728 B2Shin-Etsu Chemical Co., Ltd.
- Method and system for generation of lithography patterns27 Aug 2026US 2026/0251966 A1Vestlandets Innovasjonsselskap AS
- Reflective mask blank and reflective mask6 Aug 2026US 2026/0227686 A1Shin-Etsu Chemical Co., Ltd.
- Photomask, method of forming pattern using the same, method of manufacturing display device using the same and electronic device including display device9 Jul 2026US 2026/0194806 A1Samsung Display Co., Ltd.
- Method for determining division pattern of reticle and reticle2 Jul 2026US 2026/0186399 A1Absolics Inc.
- Improved reticle and reticle blank2 Jul 2026US 2026/0186400 A1ASML Netherlands B. V.
Most cited
By later US patents
- Methods and devices for fabricating three-dimensional nanoscale structures336US 7,704,684 B2The Board of Trustees of the University of Illinois · 2010
- Structured ASIC device with configurable die size and selectable embedded functions262US 7,337,425 B2AMI Semiconductor, Inc. · 2008
- Process of doping silver image in chalcogenide layer193US 4,269,935 AIonomet Company, Inc. · 1981
- Gray scale mask and depth pattern transfer technique using inorganic chalcogenide glass190US 5,998,066 AAerial Imaging Corporation · 1999
- Globally planarized binary optical mask using buried absorbers146US 5,474,865 ASematech, Inc. · 1995