G01N 23/2273
Measuring photoelectron spectrum
Official title: Measuring photoelectron spectrum, e.g. electron spectroscopy for chemical analysis [ESCA] or X-ray photoelectron spectroscopy [XPS]
G01N23/2273 (Measuring photoelectron spectrum) appears on 157 US grants and 184 published applications in this corpus.
Search patents in G01N- Granted patents
- 157
- Published applications
- 184
- Assignees
- 123
- Inventors
- 434
- Latest grant
- 29 Sep 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1987 | 1 | 0 |
| 1988 | 1 | 0 |
| 1989 | 4 | 0 |
| 1990 | 0 | 0 |
| 1991 | 3 | 0 |
| 1992 | 2 | 0 |
| 1993 | 1 | 0 |
| 1994 | 6 | 0 |
| 1995 | 4 | 0 |
| 1996 | 2 | 0 |
| 1997 | 2 | 0 |
| 1998 | 1 | 0 |
| 1999 | 1 | 0 |
| 2000 | 1 | 0 |
| 2001 | 1 | 0 |
| 2002 | 0 | 0 |
| 2003 | 0 | 0 |
| 2004 | 1 | 1 |
| 2005 | 1 | 3 |
| 2006 | 0 | 3 |
| 2007 | 3 | 2 |
| 2008 | 3 | 2 |
| 2009 | 0 | 2 |
| 2010 | 0 | 0 |
| 2011 | 3 | 4 |
| 2012 | 1 | 3 |
| 2013 | 6 | 5 |
| 2014 | 3 | 6 |
| 2015 | 4 | 6 |
| 2016 | 6 | 7 |
| 2017 | 6 | 9 |
| 2018 | 6 | 12 |
| 2019 | 6 | 10 |
| 2020 | 10 | 19 |
| 2021 | 9 | 12 |
| 2022 | 10 | 21 |
| 2023 | 11 | 18 |
| 2024 | 15 | 13 |
| 2025 | 17 | 16 |
| 2026 | 6 | 10 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Patterned X-ray emitting target29 Sep 2026US 12,749,642 B2Nova Measuring Instruments Ltd.
- In situ and tunable deposition of a film16 Jun 2026US 12,655,515 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Production solutions for high-throughput/precision XPS metrology using unsupervised machine learning16 Jun 2026US 12,656,279 B2Nova Measuring Instruments Ltd.
- Method for characterizing energy level of core/shell nanoparticle12 May 2026US 12,625,099 B2Korea Research Institute of Standards and Science
- Angle-resolving photoelectron spectrometer and method20 Jan 2026US 12,529,664 B2Scienta Omicron AB
- Method for measuring defects in two-component compound wafer and apparatus thereof8 Oct 2026US 2026/0309655 A1SK Siltron Co., Ltd.
- In situ and tunable deposition of a film1 Oct 2026US 2026/0297727 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Reliable non-destructive determination of sample parameter values24 Sep 2026US 2026/0287529 A1SPECS Surface Nano Analysis GmbH
- Production solutions for high-throughput/precision xps metrology using unsupervised machine learning27 Aug 2026US 2026/0251594 A1Nova Measuring Instruments Ltd.
- Switching between vacuum-pressure operation and near-atmospheric-pressure operation in a material analysis system14 May 2026US 2026/0135073 A1SPECS Surface Nano Analysis GmbH
Most cited
By later US patents
- Thiol labeling of DNA for attachment to gold surfaces400US 5,472,881 AUniversity of Utah Research Foundation · 1995
- Nondestructive characterization of thin films using measured basis spectra58US 6,800,852 B2ReVera Incorporated · 2004
- X-ray photoelectron emission spectrometry system47US 5,280,176 AThe United States of America as represented by the Secretary of Commerce · 1994
- Vessel inspection apparatus and methods44US 8,512,796 B2Si02 Medical Products, Inc. · 2013
- Anode assembly for generating x-rays and instrument with such anode assembly43US 5,602,899 APhysical Electronics, Inc. · 1997