X-ray photoelectron emission spectrometry system
AssigneeThe United States of America as represented by the Secretary of Commerce
InventorsTerrence J. Jach, Stephen M. Thurgate
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AssigneeThe United States of America as represented by the Secretary of Commerce
InventorsTerrence J. Jach, Stephen M. Thurgate
Estimating the term…
A system is disclosed for performing x-ray photoelectron emission analysis which uses a collimated x-ray beam directed to an optically polished sample at a small grazing angle of incidence, a fixed sample/electron spectrometer geometry, and an x-ray detector for detecting x-rays reflected off of the sample. With the system, an enhancement of the x-ray field at layer interfaces in a multilayer sample can take place. The system permits depth profiling of an over layer on a substrate, such as a metal or metal oxide on a metal substrate. The enhancement permits absolute calibration of depth-dependence. The system reduces lineshape distortions due to inelastic electron scattering of exiting photoelectrons and eliminates energy distortions due to changes in the sample position relative to the focal point of the electron spectrometer.
An x-ray photoelectron emission analyzer apparatus for analyzing a sample in an evacuated chamber, the apparatus comprising:
An x-ray photoelectron emission analyzer apparatus for analyzing a sample in an evacuated chamber, the apparatus comprising:
A method for analyzing a multilayer sample having a first layer and a second layer, wherein the first layer is a top layer and has a first-layer critical angle, and wherein the second layer has a second-layer critical angle, the method comprising the steps of:
A method for analyzing a multilayer sample having a first layer and a second layer, wherein the first layer is a top layer and has a first-layer critical angle, and wherein the second layer has a second-layer critical angle, the method comprising the steps of:
A method for analyzing a sample, comprising the steps of:
Dependencies are inferred from the claim text.