G01N 23/2258
Measuring secondary ion emission
Official title: Measuring secondary ion emission, e.g. secondary ion mass spectrometry [SIMS] (mass-to-charge ratio analysis aspects of SIMS for material analysis G01N27/62)
G01N23/2258 (Measuring secondary ion emission) appears on 109 US grants and 119 published applications in this corpus.
Search patents in G01N- Granted patents
- 109
- Published applications
- 119
- Assignees
- 87
- Inventors
- 306
- Latest grant
- 14 Apr 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 1 | 0 |
| 1977 | 0 | 0 |
| 1978 | 0 | 0 |
| 1979 | 0 | 0 |
| 1980 | 0 | 0 |
| 1981 | 0 | 0 |
| 1982 | 0 | 0 |
| 1983 | 0 | 0 |
| 1984 | 0 | 0 |
| 1985 | 0 | 0 |
| 1986 | 1 | 0 |
| 1987 | 0 | 0 |
| 1988 | 0 | 0 |
| 1989 | 2 | 0 |
| 1990 | 2 | 0 |
| 1991 | 1 | 0 |
| 1992 | 0 | 0 |
| 1993 | 3 | 0 |
| 1994 | 2 | 0 |
| 1995 | 0 | 0 |
| 1996 | 2 | 0 |
| 1997 | 1 | 0 |
| 1998 | 0 | 0 |
| 1999 | 3 | 0 |
| 2000 | 4 | 0 |
| 2001 | 4 | 1 |
| 2002 | 2 | 2 |
| 2003 | 2 | 2 |
| 2004 | 1 | 2 |
| 2005 | 2 | 2 |
| 2006 | 1 | 3 |
| 2007 | 4 | 3 |
| 2008 | 1 | 2 |
| 2009 | 0 | 2 |
| 2010 | 4 | 3 |
| 2011 | 1 | 6 |
| 2012 | 2 | 4 |
| 2013 | 4 | 3 |
| 2014 | 4 | 8 |
| 2015 | 2 | 5 |
| 2016 | 5 | 4 |
| 2017 | 5 | 6 |
| 2018 | 3 | 7 |
| 2019 | 7 | 8 |
| 2020 | 4 | 7 |
| 2021 | 8 | 12 |
| 2022 | 6 | 6 |
| 2023 | 5 | 6 |
| 2024 | 4 | 8 |
| 2025 | 4 | 3 |
| 2026 | 2 | 4 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Joint nanoscale three-dimensional imaging and chemical analysis14 Apr 2026US 12,601,698 B2Luxembourg Institute of Science and Technology (List)
- Measurement of lateral dopant concentration and distribution in high aspect ratio trench structures10 Mar 2026US 12,575,379 B2APPLIED Materials.Inc.
- Multiple plasma ion source for inline secondary ion mass spectrometry21 Oct 2025US 12,452,988 B2APPLIED Materials.Inc.
- Application of ToF-SIMS for analysis of formation fluid samples and formation rock samples14 Oct 2025US 12,442,295 B2Schlumberger Technology Corporation
- Standard sample film, method for producing standard sample film, standard sample, sample set, quantitative analysis method, and transfer film10 Jun 2025US 12,326,418 B2FUJIFILM Corporation
- Surface mass spectrometry device9 Jul 2026US 2026/0194478 A1
- Tissue Imaging Replicas14 May 2026US 2026/0133186 A1Standard BioTools Canada Inc.
- Adaptive count rate modulation to increase depth profile dynamic range in secondary ion mass spectroscopy29 Jan 2026US 2026/0029359 A1Nova Measuring Instruments Ltd.
- Multiple Plasma Ion Source for Inline Secondary Ion Mass Spectrometry22 Jan 2026US 2026/0025902 A1APPLIED Materials.Inc.
- Metal-Labeled Polymer Microbeads with Control Over Labeling Level22 May 2025US 2025/0163239 A1The Governing Council of the University of Toronto
Most cited
By later US patents
- Device and method for analyzing an organic sample265US 8,263,933 B2Carl Zeiss NTS GmbH · 2012
- Voltage contrast test structure87US 7,217,579 B2Applied Materials Israel Ltd. · 2007
- Process for analysis of a sample34US 6,078,045 AAtomika Instruments GmbH · 2000
- Method for testing semiconductor device23US 6,037,588 AOki Electric Industry Co., Ltd. · 2000
- Method and apparatus for analyzing the internal chemistry and compositional variations of materials and devices20US 4,874,946 AThe United States of America as represented by the United States Department of Energy · 1989