Multiple plasma ion source for inline secondary ion mass spectrometry
AssigneeApplied Materials, Inc.
InventorsMing Hong Yang, Dimitry Kouzminov, Arun Ramaswamy Srivatsa
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AssigneeApplied Materials, Inc.
InventorsMing Hong Yang, Dimitry Kouzminov, Arun Ramaswamy Srivatsa
Estimating the term…
Methods leverage premixed gas mixtures to perform a metrology process on a substrate using an inline secondary ion mass spectrometry (SIMS) process. The premixed gas mixture of two or more gases is injected into a plasma chamber that is configured to produce sputtering ions for the inline SIMS process. The two or more gases produce non-metallic ion species which are compatible with downstream substrate fabrication processes and allow further fabrication to be performed on the substrate after the inline SIMS process has completed. The sputtering ions are ejected from the plasma chamber into a magnetic field. The intensity of the magnetic field is altered to select a single species of ions. The single species of ions are directed towards a surface of the substrate and secondary ions sputtered from the surface of the substrate by the selected species of ions are detected and analyzed.
A method for performing a metrology process on a substrate using an inline secondary ion mass spectrometry (SIMS) process, comprising:
A non-transitory, computer readable medium having instructions stored thereon that, when executed, cause a method for performing a metrology process on a substrate using an inline secondary ion mass spectrometry (SIMS) process to be performed, the method comprising:
An apparatus for performing an inline secondary ion mass spectrometry (SIMS) process, comprising:
Dependencies are inferred from the claim text.