G01N 2201/11
Monitoring and controlling the scan
G01N2201/11 (Monitoring and controlling the scan) appears on 25 US grants and 30 published applications in this corpus.
Search patents in G01N- Granted patents
- 25
- Published applications
- 30
- Assignees
- 32
- Inventors
- 107
- Latest grant
- 4 Aug 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1986 | 3 | 0 |
| 1987 | 1 | 0 |
| 1988 | 0 | 0 |
| 1989 | 0 | 0 |
| 1990 | 1 | 0 |
| 1991 | 1 | 0 |
| 1992 | 0 | 0 |
| 1993 | 0 | 0 |
| 1994 | 0 | 0 |
| 1995 | 0 | 0 |
| 1996 | 0 | 0 |
| 1997 | 0 | 0 |
| 1998 | 0 | 0 |
| 1999 | 0 | 0 |
| 2000 | 0 | 0 |
| 2001 | 0 | 0 |
| 2002 | 0 | 0 |
| 2003 | 0 | 0 |
| 2004 | 0 | 1 |
| 2005 | 0 | 1 |
| 2006 | 0 | 0 |
| 2007 | 1 | 0 |
| 2008 | 0 | 0 |
| 2009 | 1 | 1 |
| 2010 | 0 | 0 |
| 2011 | 0 | 1 |
| 2012 | 1 | 0 |
| 2013 | 1 | 0 |
| 2014 | 0 | 0 |
| 2015 | 0 | 2 |
| 2016 | 1 | 2 |
| 2017 | 2 | 2 |
| 2018 | 1 | 1 |
| 2019 | 2 | 3 |
| 2020 | 1 | 1 |
| 2021 | 2 | 0 |
| 2022 | 0 | 1 |
| 2023 | 0 | 1 |
| 2024 | 1 | 4 |
| 2025 | 2 | 5 |
| 2026 | 3 | 4 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
Recent patents
- Apparatus and method for measuring wafers4 Aug 2026US 12,699,058 B2Precitec Optronik GmbH
- Sample observation device and sample observation method23 Jun 2026US 12,663,375 B2Hamamatsu Photonics K.K.
- Method for quality inspection of etching paste material based on spectral response difference12 May 2026US 12,625,070 B2
- Optimal parameter selection for structured light metrology11 Mar 2025US 12,247,829 B2Lawrence Livermore National Security, LLC
- Process tool for analyzing bonded workpiece interface21 Jan 2025US 12,205,855 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Method, minflux microscope and computer program for localizing or tracking emitters10 Sep 2026US 2026/0267122 A1Abberior Instruments GmbH
- Focus tracking techniques for inspection system25 Jun 2026US 2026/0177495 A1Onto Innovation Inc.
- Inspection during the manufacture of modules or precursors of modules9 Apr 2026US 2026/0100395 A1MB AUTOMATION GmbH & Co. KG
- Method for quality inspection of etching paste material based on spectral response difference15 Jan 2026US 2026/0016405 A1Jiangsu Sambon Technology Co., Ltd.
- Implementing oblique view imaging systems for die bonding inspection11 Dec 2025US 2025/0377308 A1University of Massachusetts
Most cited
By later US patents
- Particle detection on patterned wafers and the like173US 4,898,471 ATencor Instruments · 1990
- Light collector for optical contaminant and flaw detector93US 4,601,576 ATencor Instruments · 1986
- Dual collector optical flaw detector42US 4,597,665 ATencor Instruments · 1986
- Laser imaging system30US 5,037,207 AThe Ohio State University Research Foundation · 1991
- Scanning sample, signal generation, data digitizing and retiming system13US 4,600,951 AAT&T Technologies, Inc. · 1986