Apparatus and method for measuring wafers
AssigneePrecitec Optronik GmbH
InventorsTobias Beck, Simon Mieth, Oliver Schulz, Corinna Weigelt, Stephan Weiß
Life of this patent
Estimating the term…
Loading patent…
AssigneePrecitec Optronik GmbH
InventorsTobias Beck, Simon Mieth, Oliver Schulz, Corinna Weigelt, Stephan Weiß
Estimating the term…
A device for measuring wafers includes an optical coherence tomograph, which generates a measuring light beam and directs it onto the wafer via an optical system. A scanning device deflects the measuring light beam in two spatial directions. A control unit controls the scanning device so that the measuring light beam scans the surface of the wafer successively at several measuring points. Two measuring points have a distance dmax of 140 mm≤dmax≤600 mm. An evaluation unit calculates distance values and/or thickness values from the interference signals provided by the optical coherence tomograph and, based on the distance values and/or thickness values, at least one characteristic quantity of the wafer such as TTV, warp or bow.
A device for measuring wafers, the device comprising:
A method for measuring wafers, the method comprising the steps of:
A device for measuring wafers, the device comprising:
Dependencies are inferred from the claim text.