F26B 5/005
Drying solid materials or objects by processes not involving the application of
Official title: {by dipping them into or mixing them with a chemical liquid, e.g. organic; chemical, e.g. organic, dewatering aids (F26B3/005 takes precedence; using chemical vapours or gases F26B21/40)}
F26B5/005 (Drying solid materials or objects by processes not involving the application of) appears on 185 US grants and 139 published applications in this corpus.
Search patents in F26B- Granted patents
- 185
- Published applications
- 139
- Assignees
- 125
- Inventors
- 425
- Latest grant
- 6 Oct 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 4 | 0 |
| 1977 | 2 | 0 |
| 1978 | 2 | 0 |
| 1979 | 0 | 0 |
| 1980 | 3 | 0 |
| 1981 | 0 | 0 |
| 1982 | 0 | 0 |
| 1983 | 2 | 0 |
| 1984 | 3 | 0 |
| 1985 | 1 | 0 |
| 1986 | 1 | 0 |
| 1987 | 3 | 0 |
| 1988 | 3 | 0 |
| 1989 | 5 | 0 |
| 1990 | 0 | 0 |
| 1991 | 3 | 0 |
| 1992 | 8 | 0 |
| 1993 | 9 | 0 |
| 1994 | 5 | 0 |
| 1995 | 6 | 0 |
| 1996 | 5 | 0 |
| 1997 | 7 | 0 |
| 1998 | 2 | 0 |
| 1999 | 4 | 0 |
| 2000 | 4 | 0 |
| 2001 | 5 | 0 |
| 2002 | 2 | 4 |
| 2003 | 7 | 6 |
| 2004 | 2 | 0 |
| 2005 | 2 | 4 |
| 2006 | 1 | 2 |
| 2007 | 0 | 1 |
| 2008 | 1 | 2 |
| 2009 | 2 | 2 |
| 2010 | 5 | 5 |
| 2011 | 3 | 2 |
| 2012 | 3 | 3 |
| 2013 | 0 | 8 |
| 2014 | 2 | 2 |
| 2015 | 4 | 5 |
| 2016 | 2 | 3 |
| 2017 | 4 | 1 |
| 2018 | 3 | 11 |
| 2019 | 4 | 1 |
| 2020 | 5 | 6 |
| 2021 | 6 | 7 |
| 2022 | 4 | 16 |
| 2023 | 5 | 17 |
| 2024 | 9 | 11 |
| 2025 | 16 | 14 |
| 2026 | 6 | 6 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Substrate treating apparatus6 Oct 2026US 12,753,970 B2Semes Co., Ltd.
- Substrate processing method and substrate processing apparatus16 Jun 2026US 12,656,061 B2SCREEN Holdings Co., Ltd.
- Apparatus for manufacturing semiconductor device and method of manufacturing semiconductor device using the same2 Jun 2026US 12,643,130 B2Samsung Electronics Co., Ltd.
- Method and single wafer processing system for processing of semiconductor wafers19 May 2026US 12,629,725 B2Tokyo Electron Limited
- Drying apparatus and substrate treating apparatus19 May 2026US 12,631,396 B2Semes Co., Ltd.
- Apparatus for manufacturing semiconductor device and method of manufacturing semiconductor device using the same17 Sep 2026US 2026/0273587 A1Samsung Electronics Co., Ltd.
- Substrate processing appartus2 Jul 2026US 2026/0185771 A1Semes Co., Ltd.
- Substrate processing apparatus2 Jul 2026US 2026/0185772 A1Semes Co., Ltd.
- Substrate processing apparatus2 Jul 2026US 2026/0185867 A1Semes Co., Ltd.
- Electro-osmosis-assisted drying for aerogels30 Apr 2026US 2026/0118056 A1Trustees of Tufts College
Most cited
By later US patents
- Moving zone Marangoni drying of wet objects using naturally evaporated solvent vapor125US 5,660,642 AThe Regents of the University of California · 1997
- Water displacement composition and a method of use56US 5,125,978 AMinnesota Mining and Manufacturing Company · 1992
- Method and apparatus for drying parts and microelectronic components using sonic created mist56US 5,653,045 A1997
- Procedure for the drying of silicon56US 5,714,203 AIctop Entwicklungs GmbH · 1998
- Chemical-mechanical dewatering process49US 5,670,056 AVirginia Tech Intellectual Properties, Inc. · 1997