Substrate processing apparatus

A substrate processing apparatus, the apparatus comprising:

• an upper vessel in which a first space with an open lower portion is formed;
• a lower vessel disposed below the upper vessel, the lower vessel having a second space with an open upper portion, the second space being coupled with the first space to provide a treatment space;
• a driving unit configured to move the upper vessel and the lower vessel relative to each other;
• a substrate holder coupled to the upper vessel, on which a substrate loaded into the treatment space from an external transfer robot is placed;
• a substrate support coupled to the lower vessel and supporting the substrate in the treatment space while processing the substrate;
• and
• a fluid supply unit configured to supply a supercritical fluid to the treatment space,
• the upper vessel and the lower vessel are switched in position between an open position and a closed position by the driving unit,
• the open position is a position where the upper vessel and the lower vessel relatively move to open the treatment space,
• the closed position is a position where the upper vessel and the lower vessel relatively move to close the treatment space,
• when the upper vessel and the lower vessel are switched in position from the open position to the closed position, the substrate supported by the substrate holder is handed over to the substrate support,
• the substrate holder supports an edge region of the substrate loaded into the treatment space,
• the substrate support supports a central region of the substrate in the treatment space,
• when viewed from above, the substrate holder and the substrate support do not overlap each other,
• the upper vessel includes:
• an upper wall;
• and
• a side wall extending downward from an end of the upper wall,
• the first space is a space surrounded by the upper wall and the side wall,
• the substrate holder is coupled to the side wall, and
• in the closed position, the substrate supported by the substrate support is located in the first space, and the substrate holder is located lower than the substrate supported by the substrate support.

A substrate processing apparatus comprising:

• an upper vessel in which a first space with an open lower portion is formed;
• a lower vessel disposed below the upper vessel, the lower vessel having a second space with an open upper portion, the second space being coupled with the first space to provide a treatment space;
• a driving unit configured to move the upper vessel and the lower vessel relative to each other;
• a substrate holder coupled to the upper vessel, on which a substrate loaded into the treatment space from an external transfer robot is placed;
• a substrate support coupled to the lower vessel and supporting the substrate in the treatment space while processing the substrate;
• and
• a fluid supply unit configured to supply a supercritical fluid to the treatment space,
• the upper vessel and the lower vessel are switched in position between an open position and a closed position by the driving unit,
• the open position is a position where the upper vessel and the lower vessel relatively move to open the treatment space,
• the closed position is a position where the upper vessel and the lower vessel relatively move to close the treatment space,
• when the upper vessel and the lower vessel are switched in position from the open position to the closed position, the substrate supported by the substrate holder is handed over to the substrate support,
• the upper vessel includes:
• an upper wall;
• and
• a side wall extending downward from an end of the upper wall,
• the first space is a space surrounded by the upper wall and the side wall,
• the substrate holder is coupled to the side wall, and
• the substrate support includes:
• a support plate having a disk shape;
• and
• a first protrusion protruding upward from the support plate,
• the plurality of substrate holders is provided and disposed to face each other,
• the lower surface of the side wall has an inner region in which the substrate holder is installed and an outer region that contacts an upper surface of the side wall of the lower vessel in the closed position, and
• the substrate holder includes:
• a fixing rod having a rod shape extending downward from the inner region;
• a vertical portion extending downward from the fixing rod and having an arc shape;
• a horizontal portion extending inward from an end of the vertical portion;
• and
• a second protrusion protruding upward from the horizontal portion.