Apparatus for manufacturing semiconductor device and method of manufacturing semiconductor device using the same

A method of manufacturing a semiconductor device using an apparatus for manufacturing the semiconductor device, the method comprising:

• placing an arm of a transfer device included in the apparatus into a wet treatment chamber included in the apparatus, wherein the arm is configured to transfer a substrate between the wet treatment chamber and a supercritical fluid treatment chamber included in the apparatus, and wherein the wet treatment chamber includes a support configured to support the substrate, a first nozzle, and a second nozzle;
• controlling the first nozzle to simultaneously spray a first rinsing material onto the arm and the support;
• and
• controlling the second nozzle to simultaneously spray a second rinsing material onto the arm and the support.

A method of manufacturing a semiconductor device using an apparatus for manufacturing the semiconductor device, the method comprising:

• placing an arm of a transfer device included in the apparatus into a wet treatment chamber included in the apparatus, wherein the arm is configured to transfer a substrate between the wet treatment chamber and a supercritical fluid treatment chamber included in the device, and wherein the wet treatment chamber includes a support configured to support the substrate, a first nozzle, and a second nozzle;
• simultaneously spraying a first treatment material onto the arm and the support using the first nozzle;
• and
• simultaneously spraying a second treatment material onto the arm using the second nozzle.