Drying apparatus and substrate treating apparatus

A drying apparatus for used in drying a substrate with a treating fluid remaining thereon, the drying apparatus comprising:

• a top chamber having a supply port for supplying the treating fluid;
• a bottom chamber coupled to the top chamber, wherein the top chamber and the bottom chamber are coupled with each other to define a treating space;
• a lifting/lowering unit configured to lift/lower any one of the top chamber and the bottom chamber;
• a fluid supply unit configured to supply the treating fluid to the supply port;
• a support member for supporting the substrate in the treating space;
• and
• a baffle unit installed in the top chamber to face the supply port of the top chamber, and
• wherein the baffle unit includes:
• a first baffle having first holes through which the treating fluid flows;
• and
• a second baffle spaced apart from and below the first baffle and having second holes through which the treating fluid flows, and
• wherein the first baffle and the second baffle define a buffer space for diffusing the treating fluid supplied by the fluid supply unit.

A substrate treating apparatus comprising:

• a liquid treating apparatus for liquid treating a substrate with a treating liquid;
• and
• a drying apparatus for dry treating the substrate which has been treated at the liquid treating apparatus with a treating fluid in a supercritical state, and
• wherein the drying apparatus comprises:
• a top chamber having a supply port for supplying the treating fluid;
• a bottom chamber in combination with the top chamber defining a treating space;
• a clamping unit configured to clamp the top chamber and the bottom chamber when forming the treating space by combining the top chamber and the bottom chamber;
• a lifting/lowering unit configured to lift/lower the bottom chamber to change a distance between the top chamber and the bottom chamber;
• a fluid supply unit configured to supply the treating fluid to the supply port;
• a support member installed in the top chamber and supporting the substrate to face the supply port;
• and
• a baffle unit installed in the top chamber to face the support member, and
• wherein the top chamber is provided with:
• an accommodation space;
• and
• a buffer space below the accommodation space, and
• wherein the baffle unit comprises:
• first baffles stacked on each other and installed in the accommodation space, each baffle having first holes;
• and
• a second baffle installed spaced apart from the first baffles and separating the buffer space and the treating space, and the second baffle having second holes and
• wherein a diameter of the second baffle is larger than a diameter of one of the first baffles.