Apparatus for manufacturing semiconductor device and method of manufacturing semiconductor device using the same

An apparatus for manufacturing a semiconductor device, the apparatus comprising:

• a wet treatment chamber;
• a support provided in the wet treatment chamber and configured to support a substrate;
• a first nozzle provided in the wet treatment chamber and configured to spray a first rinsing material onto the substrate;
• a second nozzle provided in the wet treatment chamber and configured to spray a second rinsing material onto the substrate;
• a supercritical fluid treatment chamber configured to supply a supercritical fluid onto the substrate to treat the substrate;
• a transfer device comprising an arm configured to transfer the substrate between the wet treatment chamber and the supercritical fluid treatment chamber;
• and
• a controller configured to control the first nozzle to simultaneously spray the first rinsing material onto the arm and the support, and to control the second nozzle to simultaneously spray the second rinsing material onto the arm and the support.